The influence of substrate temperature on femtosecond laser micro-processing of silicon, stainless steel and glass

Optics and Lasers in Engineering

Volumn 47, Issue 7-8, 2009, Pages 815-820

  Yahng, J S ^a   Nam, J R ^a   Jeoung, S C ^a  

^a Korea Research Institute of Standards and Science   (South Korea)

Author keywords

Ablation efficiency; Femtosecond laser; Temperature

Indexed keywords

ABLATION EFFICIENCY; ABLATION THRESHOLDS; FEMTOSECOND LASER; FEMTOSECOND LASER ABLATIONS; HIGH SUBSTRATE TEMPERATURES; LASER-INDUCED; MATERIAL ABLATIONS; MELTING TEMPERATURES; SUBSTRATE TEMPERATURES; THERMAL EXCITATIONS; ULTRA-FAST LASERS; WIDE BAND-GAP MATERIALS;

GLASS; LASER ABLATION; LASER EXCITATION; LASERS; MELTING POINT; NONMETALS; PULSED LASER APPLICATIONS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; STEEL METALLURGY; SUBSTRATES; SURFACE ROUGHNESS; ULTRASHORT PULSES;

STAINLESS STEEL;

EID: 67349264056     PISSN: 01438166     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optlaseng.2009.02.001     Document Type: Article

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