Surface damage of crystalline silicon by low fluence femtosecond laser pulses

Surface Review and Letters

Volumn 11, Issue 2, 2004, Pages 217-221

  Lam, Y C ^a,b   Tran, D V ^a   Zheng, H Y ^c   Murukeshan, V M ^b   Chai, J C ^b   Hardt, D E ^d  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^c SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

^d MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Damage morphology; Femtosecond laser; Silicon; Subthreshold

Indexed keywords

CRACKS; LASER PULSES; POLARIZATION; SILICON;

PITS FORMATION; SURFACE DAMAGE;

CRYSTAL STRUCTURE;

SILICON;

ARTICLE; ATMOSPHERIC PRESSURE; CHEMICAL STRUCTURE; CRYSTAL STRUCTURE; LASER; POLARIZATION; STRUCTURE ANALYSIS; SURFACE PROPERTY;

EID: 2942620139     PISSN: 0218625X     EISSN: None     Source Type: Journal    
DOI: 10.1142/S0218625X04006074     Document Type: Article

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