Femtosecond pulse laser interactions with thin silicon films and nrater formation considering optical phonons and wave interference

Microsystem Technologies

Volumn 14, Issue 9-11, 2008, Pages 1439-1446

  Sim, Hyung Sub ^a   Lee, Seong Hyuk ^a   Kang, Kwan Gu ^a  

^a Chung Ang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; BOLTZMANN EQUATION; CHLORINE COMPOUNDS; ELECTRIC FIELDS; ELECTROMAGNETIC FIELD THEORY; ELECTROMAGNETIC FIELDS; ELECTROMAGNETIC PULSE; ELECTROMAGNETISM; ENERGY TRANSFER; ESTIMATION; FLOW INTERACTIONS; LASER BEAMS; LASER FUSION; LASER PULSES; LASER THEORY; LASERS; MAGNETISM; METALLIC FILMS; MOLECULAR BEAM EPITAXY; NONMETALS; NUMERICAL ANALYSIS; OPTICAL FILMS; OPTICAL PROPERTIES; OPTICAL SYSTEMS; PHONONS; REFRACTIVE INDEX; RELAXATION PROCESSES; SEMICONDUCTING CADMIUM TELLURIDE; SILICON; STORAGE ALLOCATION (COMPUTER); THICK FILMS; THIN FILM DEVICES; THIN FILMS; TWO DIMENSIONAL; ULTRASHORT PULSES; WAVE INTERFERENCE;

ACOUSTIC PHONONS; BOLTZMANN'S TRANSPORT EQUATIONS; BULK SILICON; COMPLEX REFRACTIVE INDEX; CRATER FORMATION; DIRECT ESTIMATION; ELECTROMAGNETIC THEORIES; ENERGY RELAXATION TIMES; EQUILIBRIUM STATES; FEMTO-SECOND LASER; FEMTOSECOND PULSE LASERS; FILM-THICKNESS; INTERFERENCE EFFECTS; LASER ABSORPTION; LASER FLUENCE; LASER-ENERGY ABSORPTION; LASER-INDUCED; NON-EQUILIBRIUM; NUMBER DENSITIES; NUMERICAL STUDIES; ONE-DIMENSIONAL MODELING; OPTICAL PHONONS; PULSE DURATION; RELAXATION TIME APPROXIMATION; SILICON FILMS; STRATIFIED MEDIUM; TEMPERATURE MODELLING; THIN SILICON FILMS; THIN-FILM OPTICS; THIN-FILM STRUCTURES; TRANSFER CHARACTERISTICS; TRANSIENT BEHAVIORS; TWO-DIMENSIONAL MODELING; TWO-TEMPERATURE MODEL;

PULSED LASER APPLICATIONS;

EID: 49949100395     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-007-0554-3     Document Type: Conference Paper

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