Absence of amorphous phase in high power femtosecond laser-ablated silicon

Applied Physics Letters

Volumn 94, Issue 1, 2009, Pages

  Rogers, Matthew S ^a   Grigoropoulos, Costas P ^a   Minor, Andrew M ^b,c   Mao, Samuel S ^a,b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c National Center for Electron Microscopy   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION; AMORPHOUS MATERIALS; CRYSTALLINE MATERIALS; DC GENERATORS; LASER ABLATION; LASER APPLICATIONS; LASERS; NONMETALS; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; ULTRASHORT PULSES;

AMORPHOUS SILICON LAYERS; FEMTOSECOND LASER ABLATIONS; FEMTOSECOND LASER PULSES; FEMTOSECOND LASERS; HIGH POWERS; MATERIALS PROCESSING; NANOSECOND LASER ABLATIONS; SINGLE CRYSTALLINE LAYERS;

AMORPHOUS SILICON;

EID: 58149513251     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3052693     Document Type: Article

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