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Volumn 509, Issue 6, 2011, Pages 3141-3147

Structure and mechanical properties of (TiVCr)N coatings prepared by energetic bombardment sputtering with different nitrogen flow ratios

Author keywords

Coating materials; Crystal structure; Nitride materials; Thin films; Vapor deposition

Indexed keywords

ALLOY TARGET; BODY-CENTERED CUBIC; COATING MATERIAL; COLUMNAR STRUCTURES; DC BIAS; DENSE STRUCTURES; FACE-CENTERED CUBIC; FACETED SURFACES; FLOW RATIOS; GRAIN SIZE; NITRIDE COATING; NITRIDE MATERIALS; NITROGEN FLOW; PREFERRED ORIENTATIONS; RF-MAGNETRON SPUTTERING; SI SUBSTRATES;

EID: 78651354261     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2010.12.026     Document Type: Article
Times cited : (39)

References (57)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.