Structural relaxation and nanoindentation response in Zr-Cu-Ti amorphous thin films

Applied Physics Letters

Volumn 93, Issue 19, 2008, Pages

  Chou, H S ^a   Huang, J C ^a   Chang, L W ^a   Nieh, T G ^b  

^a NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

^b University of Tennessee Knoxville   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; ELECTROMECHANICAL DEVICES; MECHANICAL PROPERTIES; MEMS; MICROELECTROMECHANICAL DEVICES; THICK FILMS; THIN FILMS; ZIRCONIUM;

COSPUTTERING; MICRO-ELECTRO-MECHANICAL SYSTEMS; TI CONTENTS; TI THIN FILMS;

COPPER;

EID: 56249085561     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2999592     Document Type: Article

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