Effect of crystallographic orientation of nanocrystalline TiN on structural, electrical and mechanical properties of TiN/NiTi thin films

Journal of Alloys and Compounds

Volumn 479, Issue 1-2, 2009, Pages 166-172

  Kumar, Ashvani ^a   Singh, Devendra ^b   Kumar, Ravi ^c   Kaur, Davinder ^a  

^a Centre of Nanotechnology   (India)

^b INDIAN INSTITUTE OF TECHNOLOGY ROORKEE   (India)

^c INTER UNIVERSITY ACCELERATOR CENTRE   (India)

Author keywords

Nanocrystalline; Nanoindentation; TiN NiTi thin films

Indexed keywords

BERKOVICH INDENTER; CRYSTALLOGRAPHIC ORIENTATIONS; DC-MAGNETRON SPUTTERING; ELECTRICAL AND MECHANICAL PROPERTIES; HIGH ELASTIC MODULUS; HIGH HARDNESS; MILLI NEWTONS; NANO INDENTATIONS; NANOCRYSTALLINE; NITI FILMS; PHASE TRANSFORMATIONS; PREFERENTIAL ORIENTATIONS; SHAPE MEMORY ALLOYS; SILICON SUBSTRATES; SPUTTERING GAS; TIN FILMS; TIN/NITI THIN FILMS; TOP SURFACES;

MECHANICAL PROPERTIES; NANOCRYSTALLINE SILICON; NANOINDENTATION; SEMICONDUCTING SILICON COMPOUNDS; THIN FILMS; TITANIUM COMPOUNDS; TITANIUM NITRIDE; WEAR RESISTANCE;

NANOCRYSTALLINE ALLOYS;

EID: 67349167680     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2008.12.116     Document Type: Article

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