Effect of nitrogen flow rate on properties of nanostructured TiZrN thin films produced by radio frequency magnetron sputtering

Thin Solid Films

Volumn 518, Issue 24, 2010, Pages 7308-7311

  Lin, Yu Wei ^a,b   Huang, Jia Hong ^b   Yu, Ge Ping ^b  

^a INSTRUMENT TECHNOLOGY RESEARCH CENTER   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

(Ti,Zr)N; Magnetron sputtering; Nitrogen flow rate

Indexed keywords

(TI,ZR)N; GRAIN SIZE; NANO-STRUCTURED; NITROGEN FLOW RATE; NITROGEN FLOW RATES; PREFERRED ORIENTATIONS; RADIO FREQUENCY MAGNETRON SPUTTERING; STRUCTURE AND PROPERTIES;

MAGNETRON SPUTTERING; NITROGEN; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION;

ZIRCONIUM;

EID: 77956883059     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.04.099     Document Type: Conference Paper

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