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Journal of Alloys and Compounds

Volumn 472, Issue 1-2, 2009, Pages 91-96

Characterization and temperature controlling property of TiAlN coatings deposited by reactive magnetron co-sputtering

(7) Chen, J T a Wang, J a,b Zhang, F a Zhang, G A a Fan, X Y a Wu, Z G a Yan, P X a,b

a LANZHOU UNIVERSITY (China)

b INSTITUTE OF GEOLOGY AND GEOPHYSICS (China)

Author keywords

Magnetron sputtering; Thermal controlling; TiAlN coatings; XRD

Indexed keywords

ALUMINA; ALUMINUM; ALUMINUM NITRIDE; ARGON; ATOMIC SPECTROSCOPY; COATINGS; CRYSTAL ATOMIC STRUCTURE; ELECTRODEPOSITION; EMISSION SPECTROSCOPY; FIELD EMISSION; HARDENING; MAGNETRONS; NITRIDES; OPTICAL EMISSION SPECTROSCOPY; OPTICAL MICROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SPUTTER DEPOSITION; TIN; TITANIUM; TITANIUM COMPOUNDS; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS;

AFM; AFTER HEATS; ALN; CHEMICAL COMPOSITIONS; EQUILIBRIUM TEMPERATURES; FIELD-EMISSION SCANNING ELECTRON MICROSCOPES; FLUX RATIOS; FORCE MICROSCOPIES; OPTICAL REFLECTANCES; OXYNITRIDE; POTENTIAL MATERIALS; PREFERRED ORIENTATIONS; PROSPECTIVE APPLICATIONS; REACTIVE MAGNETRON CO-SPUTTERING; SI WAFERS; TEMPERATURE CONTROLLING; TERNARY COATINGS; THERMAL CONTROLLING; TIALN COATINGS; TITANIUM ALUMINUM NITRIDES; X-RAY DIFFRACTIONS; X-RAY PHOTOELECTRON SPECTROSCOPIES; XPS SPECTRUM; XRD;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 61349110869 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2008.04.083 Document Type: Article

Times cited : (87)

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