Characteristics of (TiAlCrNbY)C films deposited by reactive magnetron sputtering

Surface and Coatings Technology

Volumn 204, Issue 12-13, 2010, Pages 2010-2014

  Braic, M ^a   Braic, V ^a   Balaceanu, M ^a   Zoita, C N ^a   Vladescu, A ^a   Grigore, E ^b  

^a NATIONAL INSTITUTE FOR OPTOELECTRONICS   (Romania)

^b NATIONAL INSTITUTE FOR LASER   (Romania)

Author keywords

Magnetron sputtering; Mechanical; Multi component (TiAlCrNbY)C coatings; Structure; Tribological performance

Indexed keywords

AFM; AMORPHOUS STRUCTURES; C FILMS; CARBIDE COATING; CARBON CONCENTRATIONS; CARBON CONTENT; CHEMICAL BINDING; COATINGS STRUCTURE; DRY FRICTION COEFFICIENT; FILM COMPOSITION; FINE GRAINED; FRICTION AND WEAR; HARDNESS MEASUREMENT; HARDNESS VALUES; MULTICOMPONENTS; PREFERRED ORIENTATIONS; REACTIVE CO-SPUTTERING; REACTIVE MAGNETRON SPUTTERING; SMOOTH SURFACE; SOLID SOLUTION PHASE; STRUCTURE; SURFACE PROFILOMETRY; TRIBOLOGICAL PERFORMANCE; TRIBOLOGICAL TESTS;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CARBIDES; CARBON FILMS; CHROMATE COATINGS; CHROMIUM; FRICTION; HARDNESS; MAGNETRONS; MORPHOLOGY; SPUTTER DEPOSITION; STOICHIOMETRY; TENSILE STRESS; TRIBOLOGY; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 76349110107     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.10.049     Document Type: Article

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