Structures and characterizations of TiVCr and TiVCrZrY films deposited by magnetron sputtering under different bias powers

Journal of the Electrochemical Society

Volumn 157, Issue 3, 2010, Pages

  Tsai, Du Cheng ^a   Shieu, Fuh Sheng ^a   Chang, Shou Yi ^a   Yao, Hsiao Chiang ^a   Deng, Min Jen ^a  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

BIAS POWER; BODY-CENTERED CUBIC CRYSTALS; ELECTRICAL RESISTIVITY; HEXAGONAL CLOSE-PACKED; MICROSTRUCTURE AND PROPERTIES; RADIO FREQUENCIES; SI SUBSTRATES; SUBSTRATE BIAS; HEXAGONAL CLOSE PACKED;

ELECTRIC CONDUCTIVITY; MAGNETRONS; MECHANICAL PROPERTIES; OPTICAL PROPERTIES; SUBSTRATES; SURFACE STRUCTURE; CRYSTAL MICROSTRUCTURE; MAGNETRON SPUTTERING; MICROSTRUCTURE;

CRYSTAL MICROSTRUCTURE; CRYSTAL STRUCTURE;

EID: 76349100985     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3285047     Document Type: Article

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