Effect of nitrogen flow ratio on the microstructure evolution and nanoindented mechanical property of the Ta-Si-N thin films

Journal of Materials Research

Volumn 23, Issue 2, 2008, Pages 494-499

  Chung, C K ^a   Chen, T S ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

FLOW RATE; MECHANICAL PROPERTIES; METALLOGRAPHIC MICROSTRUCTURE; MICROSTRUCTURAL EVOLUTION; NANOCRYSTALS; NANOHARDNESS; NANOMECHANICS; POLYCRYSTALLINE MATERIALS; THIN FILMS;

NITROGEN FLOW RATIO;

AMORPHOUS FILMS;

EID: 39749093653     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2008.0065     Document Type: Article

References (20)

1. S. PalDey and S.C. Deevi: Properties of single layer and gradient (Ti,Al)N coatings. Mater. Sci. Eng., A 342, 58 (2003).
2. E. Kolawa, J.S. Chen, J.S. Reid, P.J. Pokela, and M.A. Nicolet: Tantalum-based diffusion-barriers in Si/Cu VLSI metallizations. J. Appl. Phys. 70, 1369 (1991).
3. R. Hubner, M. Hecker, N. Mattern, A. Voss, J. Acker, V. Hoffmann, K. Wetzig, H.J. Engelmann, E. Zschech, H. Heuer, and C. Wenzel: Influence of nitrogen content on the crystallization behavior of thin Ta-Si-N diffusion barriers. Thin Solid Films 468, 183 (2004).
4. C.K. Chung, T.S. Chen, C.C. Peng, and B.H. Wu: Thermal stability of Ta-Si-N nanocomposite thin films at different nitrogen flow ratios. Surf. Coat. Technol. 201, 3947 (2006).
5. S.J. Suresha, R. Bhide, V. Jayaram, and S.K. Biswas: Processing, microstructure and hardness of TiN/(Ti, Al)N multilayer coatings. Mater. Sci. Eng., A 429, 252 (2006).
6. S. Veprek, M.G.J. Veprek-Heijman, P. Karvankova, and J. Prochazka: Different approaches to superhard coatings and nanocomposites. Thin Solid Films 476, 1 (2005).
7. J. Musil: Hard and superhard nanocomposite coatings. Surf. Coat. Technol. 125, 322 (2000).
8. J.W. Nah, W.S. Choi, S.K. Hwang, and C.M. Lee: Chemical state of (Ta, Si)N reactively sputtered coating on a high-speed steel substrate. Surf. Coat. Technol. 123, 1 (2000).
9. C.K. Chung and P.J. Su: Material characterization and nanohardness measurement of nanostructured Ta-Si-N film. Surf. Coat. Technol. 188-89, 420 (2004).
10. C.K. Chung and T.S. Chen: Effect of microstructures on the electrical and optoelectronic properties of nanocrystalline Ta-Si-N thin films by reactive magnetron cosputtering. Scripta Mater. 57, 611 (2007).
11. B. Zhu, R.J. Asaro, P. Krysl, K. Zhang, and J.R. Weertman: Effects of grain size distribution on the mechanical response of nanocrystalline metals: Part II. Acta Mater. 54, 3307 (2006).
12. K.S. Kumar, H. Van Swygenhoven, and S. Suresh: Mechanical behavior of nanocrystalline metals and alloys. Acta Mater. 51, 5743 (2003).
13. x thin films deposited by dc reactive magnetron sputtering. J. Appl. Phys. 98, 123511 (2005).
14. W.C. Oliver and G.M. Pharr: An important technique for determining hardness and elastic-modulus using load and displacement sensing indentation experiments. J. Mater. Res. 7, 1564 (1992).
15. I.N. Sneddon: The relation between load and penetration in the axisymmetric Boussinesq problem for a punch of arbitrary profile. Int. J. Eng. Sci. 3, 47 (1965).
16. X.D. Li and B. Bhushan: A review of nanoindentation continuous stiffness measurement technique and its applications. Mater. Charact. 48, 11 (2002).
17. JCPDS Nos. 26-0985, 32-1283, 06-0552, 72-1275, and 18-1312. International Center for Diffraction Data: Newton Square, PA, 1997.
18. B.D. Cullity: Elements of X-Ray Diffractions, 2nd ed. (Addison-Wesley Press, London, 1987), Chaps. 3-4.
19. S. Zhang, D. Sun, Y.Q. Fu, and H.J. Du: Recent advances of superhard nanocomposite coatings: A review. Surf. Coat. Technol. 167, 113 (2003).
20. J. Schiotz and K.W. Jacobsen: A maximum in the strength of nanocrystalline copper. Science 301, 1357 (2003).