-
1
-
-
25144462707
-
-
Ü. Özgür, Y.I. Alivov, C. Liu, A. Teke, M.A. Reshchikov, S. Do an, V. Avrutin, S.J. Cho, and H. Morkoc J. Appl. Phys. 98 2005 041301
-
(2005)
J. Appl. Phys.
, vol.98
, pp. 041301
-
-
Özgür, Ü.1
Alivov, Y.I.2
Liu, C.3
Teke, A.4
Reshchikov, M.A.5
Do An, S.6
Avrutin, V.7
Cho, S.J.8
Morkoc, H.9
-
2
-
-
56949089474
-
-
P.C. Kao, S.Y. Chu, B.J. Li, J.W. Chang, H.H. Huang, Y.C. Fang, and R.C. Chang J. Alloys Compd. 467 2009 342 346
-
(2009)
J. Alloys Compd.
, vol.467
, pp. 342-346
-
-
Kao, P.C.1
Chu, S.Y.2
Li, B.J.3
Chang, J.W.4
Huang, H.H.5
Fang, Y.C.6
Chang, R.C.7
-
3
-
-
74449086313
-
-
G. Meng, X.D. Fang, Y.K. Zhou, J. Seo, W.W. Dong, S. Hasegawa, H. Asahi, H. Tambo, M.G. Kong, and L. Li J. Alloys Compd. 491 2010 72 76
-
(2010)
J. Alloys Compd.
, vol.491
, pp. 72-76
-
-
Meng, G.1
Fang, X.D.2
Zhou, Y.K.3
Seo, J.4
Dong, W.W.5
Hasegawa, S.6
Asahi, H.7
Tambo, H.8
Kong, M.G.9
Li, L.10
-
4
-
-
34547366035
-
-
C.Y. Jiang, X.W. Sun, G.Q. Lo, D.L. Kwong, and J.X. Wang Appl. Phys. Lett. 90 2007 263501
-
(2007)
Appl. Phys. Lett.
, vol.90
, pp. 263501
-
-
Jiang, C.Y.1
Sun, X.W.2
Lo, G.Q.3
Kwong, D.L.4
Wang, J.X.5
-
5
-
-
77950919893
-
-
L.C. Damonte, V. Donderis, S. Ferrari, J. Orozco, and M.A. Hernandez-Fenollosa J. Alloys Compd. 495 2010 432 435
-
(2010)
J. Alloys Compd.
, vol.495
, pp. 432-435
-
-
Damonte, L.C.1
Donderis, V.2
Ferrari, S.3
Orozco, J.4
Hernandez-Fenollosa, M.A.5
-
6
-
-
70649109845
-
-
K.D. Yuan, X. Yin, J.T. Li, J.J. Wu, Y.M. Wang, and F.Q. Huang J. Alloys Compd. 489 2010 694 699
-
(2010)
J. Alloys Compd.
, vol.489
, pp. 694-699
-
-
Yuan, K.D.1
Yin, X.2
Li, J.T.3
Wu, J.J.4
Wang, Y.M.5
Huang, F.Q.6
-
7
-
-
63649093020
-
-
C.D. Lokhande, P.M. Gondkar, R.S. Mane, V.R. Shinde, and S.H. Han J. Alloys Compd. 475 2009 304 311
-
(2009)
J. Alloys Compd.
, vol.475
, pp. 304-311
-
-
Lokhande, C.D.1
Gondkar, P.M.2
Mane, R.S.3
Shinde, V.R.4
Han, S.H.5
-
8
-
-
2542502582
-
-
Q. Wan, Q.H. Li, Y.J. Chen, T.H. Wang, X.L. He, J.P. Li, and C.L. Lin Appl. Phys. Lett. 84 2004 3654
-
(2004)
Appl. Phys. Lett.
, vol.84
, pp. 3654
-
-
Wan, Q.1
Li, Q.H.2
Chen, Y.J.3
Wang, T.H.4
He, X.L.5
Li, J.P.6
Lin, C.L.7
-
9
-
-
58149268952
-
-
M.W. Ahn, K.S. Park, J.H. Heo, J.G. Park, D.W. Kim, K.J. Choi, J.H. Lee, and S.H. Hong Appl. Phys. Lett. 93 2008 263103
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 263103
-
-
Ahn, M.W.1
Park, K.S.2
Heo, J.H.3
Park, J.G.4
Kim, D.W.5
Choi, K.J.6
Lee, J.H.7
Hong, S.H.8
-
10
-
-
40549099365
-
-
A.J. Cheng, Y. Tzeng, Y. Zhou, M. Park, T. Wu, C. Shannon, D. Wang, and W. Lee Appl. Phys. Lett. 92 2008 092113
-
(2008)
Appl. Phys. Lett.
, vol.92
, pp. 092113
-
-
Cheng, A.J.1
Tzeng, Y.2
Zhou, Y.3
Park, M.4
Wu, T.5
Shannon, C.6
Wang, D.7
Lee, W.8
-
13
-
-
77950435840
-
-
W. Liu, F.X. Xiu, K. Sun, Y.H. Xie, K.L. Wang, Y. Wang, J. Zou, Z. Yang, and J.L. Liu J. Am. Chem. Soc. 132 2010 2498 2499
-
(2010)
J. Am. Chem. Soc.
, vol.132
, pp. 2498-2499
-
-
Liu, W.1
Xiu, F.X.2
Sun, K.3
Xie, Y.H.4
Wang, K.L.5
Wang, Y.6
Zou, J.7
Yang, Z.8
Liu, J.L.9
-
15
-
-
32444436988
-
-
Y.J. Zeng, Z.Z. Ye, W.Z. Xu, D.Y. Li, J.G. Lu, L.P. Zhu, and B.H. Zhao Appl. Phys. Lett. 88 2009 062107
-
(2009)
Appl. Phys. Lett.
, vol.88
, pp. 062107
-
-
Zeng, Y.J.1
Ye, Z.Z.2
Xu, W.Z.3
Li, D.Y.4
Lu, J.G.5
Zhu, L.P.6
Zhao, B.H.7
-
17
-
-
67149128219
-
-
R. Qin, J.X. Zheng, J. Lu, L. Wang, L. Lai, G.F. Luo, J. Zhou, H. Li, Z.X. Gao, G.P. Li, and W.N. Mei J. Phys. Chem. C 113 2009 9541 9545
-
(2009)
J. Phys. Chem. C
, vol.113
, pp. 9541-9545
-
-
Qin, R.1
Zheng, J.X.2
Lu, J.3
Wang, L.4
Lai, L.5
Luo, G.F.6
Zhou, J.7
Li, H.8
Gao, Z.X.9
Li, G.P.10
Mei, W.N.11
-
18
-
-
67649878121
-
-
S.P. Wang, C.X. Shan, B.H. Li, J.Y. Zhang, B. Yao, D.Z. Shen, and X.W. Fan J. Cryst. Growth 311 2009 3577 3580
-
(2009)
J. Cryst. Growth
, vol.311
, pp. 3577-3580
-
-
Wang, S.P.1
Shan, C.X.2
Li, B.H.3
Zhang, J.Y.4
Yao, B.5
Shen, D.Z.6
Fan, X.W.7
-
19
-
-
67649532187
-
-
X.H. Pan, W. Guo, Z.Z. Ye, B. Liu, Y. Che, H.P. He, and X.Q. Pan J. Appl. Phys. 105 2009 113516
-
(2009)
J. Appl. Phys.
, vol.105
, pp. 113516
-
-
Pan, X.H.1
Guo, W.2
Ye, Z.Z.3
Liu, B.4
Che, Y.5
He, H.P.6
Pan, X.Q.7
-
20
-
-
3042631076
-
-
F. Zhu-Ge, Z.Z. Ye, L.P. Zhu, J.G. Lü, B.H. Zhao, J.Y. Huang, Z.H. Zhang, L. Wang, and Z.G. Ji J. Cryst. Growth 268 2004 163 168
-
(2004)
J. Cryst. Growth
, vol.268
, pp. 163-168
-
-
Zhu-Ge, F.1
Ye, Z.Z.2
Zhu, L.P.3
Lü, J.G.4
Zhao, B.H.5
Huang, J.Y.6
Zhang, Z.H.7
Wang, L.8
Ji, Z.G.9
-
23
-
-
77956666204
-
-
B. Wang, L.D. Tang, J.A. Qi, H.L. Du, and Z.B. Zhang J. Alloys Compd. 503 2010 436 438
-
(2010)
J. Alloys Compd.
, vol.503
, pp. 436-438
-
-
Wang, B.1
Tang, L.D.2
Qi, J.A.3
Du, H.L.4
Zhang, Z.B.5
-
24
-
-
77649199992
-
-
T.T. Zhao, T. Yang, B. Yao, C.X. Cong, Y.R. Sui, G.Z. Xing, Y. Sun, S.C. Su, H. Zhu, and D.Z. Shen Thin Solid Films 518 2010 3289 3292
-
(2010)
Thin Solid Films
, vol.518
, pp. 3289-3292
-
-
Zhao, T.T.1
Yang, T.2
Yao, B.3
Cong, C.X.4
Sui, Y.R.5
Xing, G.Z.6
Sun, Y.7
Su, S.C.8
Zhu, H.9
Shen, D.Z.10
-
25
-
-
33847766246
-
-
B. Xiang, P. Wang, X. Zhang, S.A. Dayeh, D.P.R. Aplin, C. Soci, D. Yu, and D. Wang Nano Lett. 7 2007 323 328
-
(2007)
Nano Lett.
, vol.7
, pp. 323-328
-
-
Xiang, B.1
Wang, P.2
Zhang, X.3
Dayeh, S.A.4
Aplin, D.P.R.5
Soci, C.6
Yu, D.7
Wang, D.8
-
26
-
-
33646433759
-
-
W.Z. Xu, Z.Z. Ye, Y.J. Zeng, L.P. Zhu, B.H. Zhao, L. Jiang, J.G. Lu, H.P. He, and S.B. Zhang Appl. Phys. Lett. 88 2006 173506
-
(2006)
Appl. Phys. Lett.
, vol.88
, pp. 173506
-
-
Xu, W.Z.1
Ye, Z.Z.2
Zeng, Y.J.3
Zhu, L.P.4
Zhao, B.H.5
Jiang, L.6
Lu, J.G.7
He, H.P.8
Zhang, S.B.9
-
27
-
-
77953321173
-
-
C. Ravichandran, G. Srinivasan, C. Lennon, S. Sivanathan, and J. Kumar Mater. Sci. Semicond. Process. 13 2010 46 50
-
(2010)
Mater. Sci. Semicond. Process.
, vol.13
, pp. 46-50
-
-
Ravichandran, C.1
Srinivasan, G.2
Lennon, C.3
Sivanathan, S.4
Kumar, J.5
-
29
-
-
75249106072
-
-
Y.R. Sui, B. Yao, J.H. Yang, H.F. Cui, X.M. Huang, T. Yang, L.L. Gao, R. Deng, and D.Z. Shen Appl. Surf. Sci. 256 2010 2726 2730
-
(2010)
Appl. Surf. Sci.
, vol.256
, pp. 2726-2730
-
-
Sui, Y.R.1
Yao, B.2
Yang, J.H.3
Cui, H.F.4
Huang, X.M.5
Yang, T.6
Gao, L.L.7
Deng, R.8
Shen, D.Z.9
-
32
-
-
58149100614
-
-
I.S. Kim, E.K. Jeong, D.Y. Kim, M. Kumar, and S.Y. Choi Appl. Surf. Sci. 255 2009 4011 4014
-
(2009)
Appl. Surf. Sci.
, vol.255
, pp. 4011-4014
-
-
Kim, I.S.1
Jeong, E.K.2
Kim, D.Y.3
Kumar, M.4
Choi, S.Y.5
-
34
-
-
53349162378
-
-
S.H. Yoon, D. Liu, D.N. Shen, M. Park, and D.J. Kim J. Mater. Sci. 43 2008 6177 6181
-
(2008)
J. Mater. Sci.
, vol.43
, pp. 6177-6181
-
-
Yoon, S.H.1
Liu, D.2
Shen, D.N.3
Park, M.4
Kim, D.J.5
-
41
-
-
42649137956
-
-
T. Tohsophon, J. Hüpkes, H. Siekmann, B. Rech, M. Schultheis, and N. Sirikulrat Thin Solid Films 516 2008 4628 4632
-
(2008)
Thin Solid Films
, vol.516
, pp. 4628-4632
-
-
Tohsophon, T.1
Hüpkes, J.2
Siekmann, H.3
Rech, B.4
Schultheis, M.5
Sirikulrat, N.6
-
42
-
-
2342435803
-
-
J. Serrano, A.H. Romero, F.J. Manjon, R. Lauck, M. Cardona, and A. Rubio Phys. Rev. B: Condens. Matter Mater. Phys. 69 2004 94306
-
(2004)
Phys. Rev. B: Condens. Matter Mater. Phys.
, vol.69
, pp. 94306
-
-
Serrano, J.1
Romero, A.H.2
Manjon, F.J.3
Lauck, R.4
Cardona, M.5
Rubio, A.6
-
43
-
-
68749114011
-
-
B. Sieber, H. Liu, G. Piret, J. Laureyns, P. Roussel, B. Gelloz, S. Szunerits, and R. Boukherroub J. Phys. Chem. C 113 2009 13643 13650
-
(2009)
J. Phys. Chem. C
, vol.113
, pp. 13643-13650
-
-
Sieber, B.1
Liu, H.2
Piret, G.3
Laureyns, J.4
Roussel, P.5
Gelloz, B.6
Szunerits, S.7
Boukherroub, R.8
-
45
-
-
0029774658
-
-
K. Vanheusden, C.H. Seager, W.L. Warren, D.R. Tallant, and J.A. Voigt Appl. Phys. Lett. 68 1996 403
-
(1996)
Appl. Phys. Lett.
, vol.68
, pp. 403
-
-
Vanheusden, K.1
Seager, C.H.2
Warren, W.L.3
Tallant, D.R.4
Voigt, J.A.5
|