Influence of post-deposition annealing on the properties of transparent conductive nanocrystalline ZAO thin films prepared by RF magnetron sputtering with highly conductive ceramic target

Thin Solid Films

Volumn 418, Issue 2, 2002, Pages 156-162

  Fang, Guojia J ^a,b   Li, Dejie ^a   Yao, Bao Lun ^a  

^a TSINGHUA UNIVERSITY   (China)

^b HUBEI UNIVERSITY OF ARTS AND SCIENCE   (China)

Author keywords

Physical properties; RF magnetron sputtering; Structural characterization; Vacuum annealing; ZAO transparent and conductive thin films

Indexed keywords

ANNEALING; CERAMIC MATERIALS; CONDUCTIVE FILMS; DEPOSITION; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; GLASS; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; SUBSTRATES; VACUUM; ZINC COMPOUNDS;

CONDUCTIVE THIN FILMS;

THIN FILMS;

EID: 0037109177     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00733-2     Document Type: Article

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