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Journal of Materials Chemistry

Volumn 20, Issue 46, 2010, Pages 10359-10365

Molecular dynamics simulations of La2O3-doped silicate intergranular films in Si3N4

(2) Jiang, Yun a Garofalini, Stephen H a

a Piscataway (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPIC GRAIN GROWTH; BASAL SURFACE; CRYSTAL SURFACES; DRIVING FORCES; HAADF-STEM; INTERGRANULAR FILMS; MOLECULAR DYNAMICS SIMULATIONS; N CONTENT; NETWORK MODIFIERS; NITRIDE SURFACE; ORIENTED SILICON; PRISM SURFACE; PURE SILICA; SURFACE SITES;

ADSORPTION; BINDING ENERGY; COMPUTER SIMULATION; FUSED SILICA; GRAIN GROWTH; LANTHANUM ALLOYS; MOLECULAR DYNAMICS; PRISMS; SEGREGATION (METALLOGRAPHY); SILICA; SILICATES; SILICON NITRIDE; SURFACE SEGREGATION; TEXTURES;

LANTHANUM;

EID: 78649232071 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/c0jm01555e Document Type: Article

Times cited : (9)

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