Molecular dynamics simulations of the locations of la ions in La-Si-O-N intergranular films in silicon nitride

Journal of the American Ceramic Society

Volumn 93, Issue 11, 2010, Pages 3886-3892

  Jiang, Yun ^a   Garofalini, Stephen H ^a  

^a Piscataway   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DRIVING FORCES; HIGH-ANGLE ANNULAR DARK FIELDS; INTERGRANULAR FILMS; LOCAL COMPOSITIONS; MOLECULAR DYNAMICS COMPUTER SIMULATIONS; MOLECULAR DYNAMICS SIMULATIONS; ORIENTED SILICON; PREFERENTIAL SEGREGATION; PRISM SURFACE;

ADSORPTION; BINDING ENERGY; BINDING SITES; COMPUTER SIMULATION; IONS; MOLECULAR DYNAMICS; NITROGEN; NUCLEAR ENERGY; POTENTIAL ENERGY; PRISMS; SEGREGATION (METALLOGRAPHY); SILICATES; SILICON NITRIDE; TEXTURES; TRANSMISSION ELECTRON MICROSCOPY;

SURFACE SEGREGATION;

EID: 78549275483     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2010.03936.x     Document Type: Article

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