Composition and chemical width of ultrathin amorphous films at grain boundaries in silicon nitride

Journal of Materials Research

Volumn 13, Issue 2, 1998, Pages 376-387

  Gu, H ^a,b   Cannon, R M ^c   Ruble M ^b  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; COMPOSITION; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON MICROSCOPY; INTERFACES (MATERIALS); OXIDATION; SILICON NITRIDE; SURFACE PROPERTIES; ULTRATHIN FILMS;

CHEMICAL WIDTH; FILM COMPOSITION; SURFACE OXIDATION;

GRAIN BOUNDARIES;

EID: 0031998238     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1998.0050     Document Type: Article

References (23)

1. D.R. Clarke, Ultramicroscopy 4, 33 (1979).
2. R.L. Tsai and R. Raj, J. Am. Ceram. Soc. 63, 513 (1980).
3. R. Raj, J. Geophys. Rev. B 87, 4731 (1982).
4. F.F. Lange, Am. Ceram. Soc. Bull. 62, 1368 (1983).
5. M.K. Cinibulk, H-J. Kleebe, and M. Rühle, J. Am. Ceram. Soc. 76, 426 (1993).
6. H-J. Kleebe, M.K. Cinibulk, R.M. Cannon, and M. Rüble, J. Am. Ceram. Soc. 76, 1969 (1993).
7. D.R. Clarke, Ultramicroscopy 4, 33 (1979).
8. D.R. Clarke, T. M. Shaw, A.P. Philips, and R.G. Horn, J. Am. Ceram. Soc. 76, 1201 (1993).
9. H-J. Kleebe, M.J. Hoffmann, and M. Rühle, Z. Metalld. 83, 610 (1992).
10. I. Tanaka, H-J. Kleebe, M.K. Cinibulk, J. Bruley, D.R. Clarke, and M. Rühle, J. Am. Ceram. Soc. 77, 911 (1994).
11. 4 Ceramics, edited by M.J. Hoffmann and G. Petzow (NATO ASI Series E: Applied Sciences 276, Kluwer Academic Publishers, Dordrecht, The Netherlands, 1994), p. 291.
12. J.A.S. Ikeda, Y-M. Chiang, A.J. Garratt-Reed, and J.B. Vander Sande, J. Am. Ceram. Soc. 76, 2447 (1993).
13. Y-M. Chiang, L.A. Silverman, R.H. French, and R.M. Cannon, J. Am. Ceram. Soc. 77, 1143 (1994).
14. J. Bruley, I. Tanaka, H-J. Kleebe, and M. Rühle, Anal. Chim. Act. 297, 97 (1994).
15. H. Gu, X. Pan, R.M. Cannon, and M. Rüble, J. Am. Ceram. Soc. (to be published).
16. J. Bruley, Ultramicroscopy 4, 33 (1979).
17. H. Gu, M. Ceh, S. Stemmer, H. Müllejans, and M. Rühle, Ultramicroscopy 59, 215 (1995).
18. I. Tanaka, G. Pezzotti, T. Okamoto, and Y. Mitamoto, J. Am. Ceram. Soc. 72, 1656 (1989).
19. R. Egerton, Electron Energy-Loss Spectroscopy in Electron Microscopes (Plenum Press, New York and London, 1996).
20. H. Shuman and A.P. Somlyo, Ultramicroscopy 21, 23 (1987).
21. R.D. Leapman and C.R. Swyt, Ultramicroscopy 26, 393 (1988).
22. M. Tencé, M. Quartuccio, and C. Colliex, Ultramicroscopy 58, 42 (1995).
23. 4 Ceramics, edited by M.J. Hoffmann and G. Petzow (NATO ASI Series E: Applied Sciences 276, Kluwer Academic Publishers, Dordrecht, The Netherlands, 1994), p. 275.