Grain boundary films in rare-earth-glass-based silicon nitride

Journal of the American Ceramic Society

Volumn 79, Issue 3, 1996, Pages 788-792

  Wang, Chong Min ^a   Pan, Xiaoqing ^a,c   Hoffmann, Michael J ^a,c   Cannon, Rowland M ^b,c   Rühle, Manfred ^a,c  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c AMERICAN CERAMIC SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; COMPOSITION; ELECTRON ENERGY LOSS SPECTROSCOPY; GLASS; GRAIN BOUNDARIES; INTERFACES (MATERIALS); OXIDES; RARE EARTH COMPOUNDS; SURFACE PROPERTIES; THICKNESS MEASUREMENT; TRANSMISSION ELECTRON MICROSCOPY;

FILM THICKNESS; GRAIN BOUNDARY FILMS; INTERFACIAL PROPERTIES; POLYCRYSTALLINE CERAMICS; RARE EARTH GLASS;

SILICON NITRIDE;

EID: 0030105859     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.1996.tb07946.x     Document Type: Article

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