Mechanisms of dopant-induced changes in intergranular SiO2 viscosity in polycrystalline silicon nitride

Journal of the American Ceramic Society

Volumn 85, Issue 1, 2002, Pages 91-96

  Pezzotti, Giuseppe ^a   Painter, Gayle S ^b  

^a KYOTO INSTITUTE OF TECHNOLOGY   (Japan)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CRYSTAL ATOMIC STRUCTURE; DOPING (ADDITIVES); GRAIN BOUNDARIES; MORPHOLOGY; NEGATIVE IONS; POLYCRYSTALLINE MATERIALS; POLYCRYSTALS; POSITIVE IONS; SILICA; SPECTROSCOPIC ANALYSIS; VISCOSITY;

MECHANICAL SPECTROSCOPY;

SILICON NITRIDE;

EID: 0036343533     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.2002.tb00045.x     Document Type: Article

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