SCOPUS 정보 검색 플랫폼

Volumn 519, Issue 4, 2010, Pages 1307-1313

Properties of fluorinated silica glass deposited at low temperature by atmospheric plasma-enhanced chemical vapor deposition

(4) Barankin, Michael D a Williams, Thomas S a Gonzalez II, Eleazar a Hicks, Robert F a

a UNIVERSITY OF CALIFORNIA (United States)

Author keywords

Atmospheric pressure plasma; Fluorinated silicon oxide; Optical properties; Plasma enhanced chemical vapor deposition; Refractive index

Indexed keywords

ATMOSPHERIC PLASMAS; ATMOSPHERIC PRESSURE PLASMAS; ATOMIC FLUORINE; FEED RATIOS; FLUORINATED SILICON OXIDE; HYDROXYL CONTENT; LOW TEMPERATURES; OXYGEN PLASMAS; SILICA GLASS; TETRA METHYL CYCLO TETRA SILOXANES;

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; ATMOSPHERICS; ATOMS; COATINGS; FLUORINE; GLASS; HELIUM; LIGHT REFRACTION; ORGANIC POLYMERS; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA SOURCES; REFRACTIVE INDEX; REFRACTOMETERS; SILICA; SILICON OXIDES; SURFACE ROUGHNESS; VAPOR DEPOSITION;

PLASMA DEPOSITION;

EID: 78349307288 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2010.09.030 Document Type: Article

Times cited : (10)

References (34)

1
- 0037268407
- G.R. Atkins, and R.B. Charters J. Sol.-Gel. Sci. Technol. 26 2003 919
- (2003) J. Sol.-Gel. Sci. Technol. , vol.26 , pp. 919
- Atkins, G.R.¹ Charters, R.B.²

2
- 0032083547
- T. Homma, A. Satoh, S. Okada, M. Itoh, M. Yamaguchi, and H. Takahashi IEEE Trans. Instrum. Meas. 47 1998 698
- (1998) IEEE Trans. Instrum. Meas. , vol.47 , pp. 698
- Homma, T.¹ Satoh, A.² Okada, S.³ Itoh, M.⁴ Yamaguchi, M.⁵ Takahashi, H.⁶

3
- 0037799382
- T.-C. Wei J. Non-Cryst. Solids 321 2003 126
- (2003) J. Non-Cryst. Solids , vol.321 , pp. 126
- Wei, T.-C.¹

4
- 0031249742
- M.K. Bhan, J. Huang, and D. Cheung Thin Solid Films 308-309 1997 507
- (1997) Thin Solid Films , vol.308-309 , pp. 507
- Bhan, M.K.¹ Huang, J.² Cheung, D.³

5
- 0033639998
- F. Iacona, G. Casella, F.L. Via, S. Lombardo, V. Raineri, and G. Spoto Microelectron. Eng. 50 2000 67
- (2000) Microelectron. Eng. , vol.50 , pp. 67
- Iacona, F.¹ Casella, G.² Via, F.L.³ Lombardo, S.⁴ Raineri, V.⁵ Spoto, G.⁶

6
- 0032475699
- S. Hasegawa, T. Tsukaoka, T. Inokuma, and Y. Kurata J. Non-Cryst. Solids 240 1998 154
- (1998) J. Non-Cryst. Solids , vol.240 , pp. 154
- Hasegawa, S.¹ Tsukaoka, T.² Inokuma, T.³ Kurata, Y.⁴

7
- 0002280698
- F. Iacona, G. Ceriola, and G. Spoto J. Electrochem. Soc. 148 2001 F47
- (2001) J. Electrochem. Soc. , vol.148 , pp. 47
- Iacona, F.¹ Ceriola, G.² Spoto, G.³

8
- 0032476353
- K. Kim, D. Kwon, and G.S. Lee Thin Solid Films 332 1998 369
- (1998) Thin Solid Films , vol.332 , pp. 369
- Kim, K.¹ Kwon, D.² Lee, G.S.³

9
- 0030233055
- S. Mizuno, A. Verma, H. Tran, P. Lee, and B. Nguyen Thin Solid Films 283 1996 30
- (1996) Thin Solid Films , vol.283 , pp. 30
- Mizuno, S.¹ Verma, A.² Tran, H.³ Lee, P.⁴ Nguyen, B.⁵

10
- 0033410698
- V. Pankov, J.C. Alonso, and A. Ortiz J. Vac. Sci. Technol. A 17 1999 3166
- (1999) J. Vac. Sci. Technol. A , vol.17 , pp. 3166
- Pankov, V.¹ Alonso, J.C.² Ortiz, A.³

11
- 1242342971
- J.A. Roepsch, B.P. Gorman, D.W. Mueller, and R.F. Reidy J. Non-Cryst. Solids 336 2004 53
- (2004) J. Non-Cryst. Solids , vol.336 , pp. 53
- Roepsch, J.A.¹ Gorman, B.P.² Mueller, D.W.³ Reidy, R.F.⁴

12
- 1542601585
- R. Swope, and W.S. Yoo J. Vac. Sci. Technol. B 14 1996 1702
- (1996) J. Vac. Sci. Technol. B , vol.14 , pp. 1702
- Swope, R.¹ Yoo, W.S.²

13
- 30944452374
- W.-C. Hsiao, C.-P. Liu, Y.L. Wang, and Y.-L. Cheng Thin Solid Films 498 2006 289
- (2006) Thin Solid Films , vol.498 , pp. 289
- Hsiao, W.-C.¹ Liu, C.-P.² Wang, Y.L.³ Cheng, Y.-L.⁴

14
- 0030173581
- S. Mizuno, A. Verma, P. Lee, and B. Nguyen Thin Solid Films 279 1996 82
- (1996) Thin Solid Films , vol.279 , pp. 82
- Mizuno, S.¹ Verma, A.² Lee, P.³ Nguyen, B.⁴

15
- 0032662398
- S.V. Nguyen IBM J. Res. Dev. 43 1999 109
- (1999) IBM J. Res. Dev. , vol.43 , pp. 109
- Nguyen, S.V.¹

16
- 1942503308
- R. Ciriminna, S. Campestrini, and M. Pagliaro Adv. Synth. Catal. 346 2004 231
- (2004) Adv. Synth. Catal. , vol.346 , pp. 231
- Ciriminna, R.¹ Campestrini, S.² Pagliaro, M.³

17
- 33745466091
- R. Ciriminna, S. Campestrini, and M. Pagliaro Org. Biomol. Chem. 4 2006 2637
- (2006) Org. Biomol. Chem. , vol.4 , pp. 2637
- Ciriminna, R.¹ Campestrini, S.² Pagliaro, M.³

18
- 0027592947
- M. Kyoto, Y. Ohoga, S. Ishikawa, and Y. Ishiguro J. Mater. Sci. 28 1993 2738
- (1993) J. Mater. Sci. , vol.28 , pp. 2738
- Kyoto, M.¹ Ohoga, Y.² Ishikawa, S.³ Ishiguro, Y.⁴

19
- 1642382825
- M. Moravej, S.E. Babayan, G.R. Nowling, X. Yang, and R.F. Hicks Plasma Sources Sci. Technol. 13 2004 8
- (2004) Plasma Sources Sci. Technol. , vol.13 , pp. 8
- Moravej, M.¹ Babayan, S.E.² Nowling, G.R.³ Yang, X.⁴ Hicks, R.F.⁵

20
- 23844466907
- G.R. Nowling, M. Yajima, S.E. Babayan, M. Moravej, X. Yang, W. Hoffman, and R.F. Hicks Plasma Sources Sci. Technol. 14 2005 477
- (2005) Plasma Sources Sci. Technol. , vol.14 , pp. 477
- Nowling, G.R.¹ Yajima, M.² Babayan, S.E.³ Moravej, M.⁴ Yang, X.⁵ Hoffman, W.⁶ Hicks, R.F.⁷

21
- 0036465647
- G.R. Nowling, S.E. Babayan, V. Jankovic, and R.F. Hicks Plasma Sources Sci. Technol. 11 2002 97
- (2002) Plasma Sources Sci. Technol. , vol.11 , pp. 97
- Nowling, G.R.¹ Babayan, S.E.² Jankovic, V.³ Hicks, R.F.⁴

22
- 34147137073
- M.D. Barankin, E. Gonzalez Ii, A.M. Ladwig, and R.F. Hicks Sol. Energy Mater. Sol. Cells 91 2007 924
- (2007) Sol. Energy Mater. Sol. Cells , vol.91 , pp. 924
- Barankin, M.D.¹ Gonzalez Ii, E.² Ladwig, A.M.³ Hicks, R.F.⁴

23
- 55749111037
- R.A. Sailer, A. Wagner, C. Schmit, N. Klaverkamp, and D.L. Schulz Surf. Coat. Technol. 203 2008 835
- (2008) Surf. Coat. Technol. , vol.203 , pp. 835
- Sailer, R.A.¹ Wagner, A.² Schmit, C.³ Klaverkamp, N.⁴ Schulz, D.L.⁵

24
- 0003735814
- Wiley Sussex, England
- G. Socrates Infrared Characteristic Group Frequencies 1994 Wiley Sussex, England
- (1994) Infrared Characteristic Group Frequencies
- Socrates, G.¹

25
- 0344515523
- K. Awazu, and H. Kawazoe J. Appl. Phys. 94 2003 6243
- (2003) J. Appl. Phys. , vol.94 , pp. 6243
- Awazu, K.¹ Kawazoe, H.²

26
- 0035505462
- S.E. Babayan, J.Y. Jeong, A. Schutze, V.J. Tu, M. Moravej, G.S. Selwyn, and R.F. Hicks Plasma Sources Sci. Technol. 10 2001 573
- (2001) Plasma Sources Sci. Technol. , vol.10 , pp. 573
- Babayan, S.E.¹ Jeong, J.Y.² Schutze, A.³ Tu, V.J.⁴ Moravej, M.⁵ Selwyn, G.S.⁶ Hicks, R.F.⁷

27
- 0001308372
- J.-S. Chou, and S.-C. Lee J. Appl. Phys. 77 1995 1805
- (1995) J. Appl. Phys. , vol.77 , pp. 1805
- Chou, J.-S.¹ Lee, S.-C.²

28
- 0006670850
- E. Fogarassy, A. Slaoui, C. Fuchs, and J.L. Regolini Appl. Phys. Lett. 51 1987 337
- (1987) Appl. Phys. Lett. , vol.51 , pp. 337
- Fogarassy, E.¹ Slaoui, A.² Fuchs, C.³ Regolini, J.L.⁴

29
- 0020845182
- H. Wagner, and W. Beyer Solid State Commun. 48 1983 585
- (1983) Solid State Commun. , vol.48 , pp. 585
- Wagner, H.¹ Beyer, W.²

30
- 0030835203
- W.S. Yoo, R. Swope, B. Sparks, and D. Mordo J. Mater. Res. 12 1997 70
- (1997) J. Mater. Res. , vol.12 , pp. 70
- Yoo, W.S.¹ Swope, R.² Sparks, B.³ Mordo, D.⁴

31
- 0033441811
- M. Yoshimaru, S. Koizumi, K. Shimokawa, Y. Mori, H. Fukuda, and N. Matsuki J. Vac. Sci. Technol. A 17 1999 425
- (1999) J. Vac. Sci. Technol. A , vol.17 , pp. 425
- Yoshimaru, M.¹ Koizumi, S.² Shimokawa, K.³ Mori, Y.⁴ Fukuda, H.⁵ Matsuki, N.⁶

32
- 0042823650
- X. Yang Plasma Sources Sci. Technol. 12 2003 484
- (2003) Plasma Sources Sci. Technol. , vol.12 , pp. 484
- Yang, X.¹

33
- 1142309544
- G.A. Candela, D. Chandler-Horowitz, J.F. Marchiando, D.B. Novotny, B.J. Belzer, and M.C. Croarkin Standard Reference Materials 1988 37
- (1988) Standard Reference Materials , pp. 37
- Candela, G.A.¹ Chandler-Horowitz, D.² Marchiando, J.F.³ Novotny, D.B.⁴ Belzer, B.J.⁵ Croarkin, M.C.⁶

34
- 0042842529
- S.-K. JangJean, Y.-L. Wang, C.-P. Liu, W.-S. Hwang, W.-T. Tseng, and C.-W. Liu J. Appl. Phys. 94 2003 732
- (2003) J. Appl. Phys. , vol.94 , pp. 732
- Jangjean, S.-K.¹ Wang, Y.-L.² Liu, C.-P.³ Hwang, W.-S.⁴ Tseng, W.-T.⁵ Liu, C.-W.⁶

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.