Optical properties of fluorinated silicon oxide films by liquid phase deposition for optical waveguides

IEEE Transactions on Instrumentation and Measurement

Volumn 47, Issue 3, 1998, Pages 698-702

  Homma, Tetsuya ^a,b   Satoh, Atsushi ^a   Okada, Seiji ^a   Itoh, Masahiro ^b   Yamaguchi, Masaki ^a   Takahashi, Hideo ^a  

^a SHIBAURA INSTITUTE OF TECHNOLOGY   (Japan)

^b Faculty of Engineering   (Japan)

Author keywords

Fluorinated silicon oxide (siof); Heterodyne interference; Laser; Optical waveguide; Refractive index

Indexed keywords

DEPOSITION; ELECTROMAGNETIC DISPERSION; ELLIPSOMETRY; FILM GROWTH; INTEGRATED OPTOELECTRONICS; LIGHT ABSORPTION; LIGHT POLARIZATION; LIGHT TRANSMISSION; OPTICAL WAVEGUIDES; REFRACTIVE INDEX; SILICA; SOLUTIONS;

LIQUID PHASE DEPOSITION (LPD);

OPTICAL FILMS;

EID: 0032083547     PISSN: 00189456     EISSN: None     Source Type: Journal    
DOI: 10.1109/19.744328     Document Type: Article

References (24)

1. J. W. Fleming, Material dispersion in lightguide glasses, Electron. Lett., vol. 14, no. 11, pp. 326-328, May 1978.
2. T. Izawa, H. Mori, Y. Murakami, and N. Shimizu, Deposited silica waveguide for integrated optical circuits, Appl. Phys. Lett., vol. 38, no. 7, pp. 483-485, Apr. 1981.
3. R. D. Maurer, Glass fibers for optical communications, Proc. IEEE, vol. 61, no. 4, pp. 45262, Apr. 1973.
4. S. Shibata, T. Kitagawa, and M. Horiguchi, Fabrication of fluorinedoped silica glasses by the sol-gel method, J. Non-Cryst. Solids, vol. 100, pp. 269-273, 1988.
5. S. Mitachi, S. Shibata, and T. Manabe, Teflon FEP-clad fluoride glass fiber, Electron. Lett., vol. 17, no. 3, pp. 128-129, Feb. 1981.
6. T. Usami, K. Shimokawa, and M. Yoshimura, Low dielectric constant interlayer using fluorine-doped silicon oxide, Jpn. J. Appl. Phys., vol. 33, no. IB, pp. 40812, Jan. 1994.
7. 3SiF, Jpn, J. Appl. Phys., vol. 35, no. 2B, pp. 1464-1467, Feb. 1996.
8. T. Fukuda and T. Akahori, Preparation of SiOF films with low dielectric constant by ECR plasma chemical vapor deposition, Ext. Abst. SSDM, 1993, pp. 158-160.
9. T. Moriyama, O. Fukuda, K. Sanada, K. Inada, T. Edahiro, and K. Chida, Ultimately low OH content V.A.D. optical fibers, Electron. Lett., vol. 16, no. 18, pp. 698-699, Aug. 1980.
10. H. Osanai, T. Shioda, T. Moriyama, S. Araki, M. Horiguchi, T. Izawa, and H. Takata, Effect of dopants on transmission loss of low-OH- content optical fibers, Electron. Lett., vol. 12, no. 21, pp. 549-550, Oct. 1976.
11. M. Horiguchi and H. Osanai, Spectral losses of low-OH-content optical fibers, Electron. Lett., vol. 12, no. 12, pp. 310-312, June 1976.
12. H. Nagayama, H. Honda, and H. Kawahara, A new process for silica coating, J. Electrochem. Soc.. vol. 138, no. 8, pp. 2013-2016, Aug. 1988.
13. T. Goda, H. Nagayama, A. Hishinuma, and H. Kawahara, Physical and chemical properties of silicon dioxide film deposited by new process, Proc. Mater. Res. Soc. Symp.. vol. 105, 1988, pp. 283-288.
14. 2 film utilizing equilibrium reaction in aqueous solution, Proc. SPIE, vol. 1513, pp. 198-203, 1991.
15. A. Hishinuma, T. Goda, M. Kitaoka, S. Hayashi, and H. Kawahara, Formation of silicon dioxide films in acidic solutions, Proc. Appl. Surf. Sci. Conf.. vol. 48/49, pp. 40508, Aug. 1991.
16. M. Kitaoka, H. Honda, H. Yoshida, A. Takigawa, and H. Kawahara, Formation of SiO2 film on plastic substrate by liquid phase deposition method, Proc. SPIE. vol. 1519, pp. 109-114, 1991.
17. 2 films for interlayer dielectrics in ultra-large-scale integrated circuit multilevel interconnections, Thin Solid Films, vol. 249, no. 1, pp. 15-21, Sept. 1994.
18. 2 film-formation technology using liquid-phase deposition for fully planarized multilevel interconnections, J. Electrochem. Soc., vol. 140, no. 8, pp. 2410-2414, Aug. 1993.
19. H. Takahashi, C. Masuda, Y. Gotoh, and J. Koyama, Laser diode interferometer for vibration and sound pressure measurements, IEEE Trans. Instrum. Meas., vol. 38, no. 2, pp. 584-587, Apr. 1989.
20. N. Shimizu, J. Yuguchi, and H. Takahashi, Heterodyne interferometer for film thickness and refractive index measurements of optical thin-film, Proc. SPIE, vol. 2873, pp. 123-126, 1996.
21. I. H. Malitson, Interspecimen comparison of the refractive index of fused silica, J. Opt. Soc. Amer., vol. 55, no. 10, pp. 1205-1209, Oct. 1965.
22. W. A. Pliskin, Comparison of properties of dielectric films deposited by various methods, J. Vac. Sei. Technol., vol. 14, no. 5, pp. 1064-1081, Sept./Oct. 1977.
23. C. Kittel, Introduction to Solid State Physics, 5th ed. New York: Wiley, 1976, p. 411.
24. B. Tatian, Fitting refractive-index data with Sellmeier dispersion formula, Appl. Opt., vol. 23, no. 24, pp. 4477485, Dec. 1984.