Analysis of Fourier transform infrared spectra and peak shifts in plasmaenhanced chemical vapor deposited fluorinated silica glasses

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 3, 1996, Pages 1702-1705

  Swope, Richard ^a   Yoo, Woo Sik ^a  

^a NOVELLUS SYSTEMS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 1542601585     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589213     Document Type: Article

References (8)

1. T. Usami, K. Shimokawa, and M. Yoshimaru, Jpn. J. Appl. Phys. 33, 408 (1993).
2. W. S. Yoo and R. Swope, Jpn. J. Appl. Phys. 35, L273 (1996).
3. R. Swope, W. S. Yoo, J. Hsieh, H. te Nijenhuis, S. Schuchmann, F. Nagy, and D. Mordo, in Proceedings of Dielectrics for ULSI Multilevel Interconnection (DUMIC) (1996).
4. K. Shimokawa, in SEMICON Japan Technical Session Proceedings (1993) (unpublished), p. 211.
5. D. Carl, D. Mordo, B. Sparks, M. Logan, and J. Ritter, Proceedings of Dielectrics for ULSI Multilevel Interconnection Conf. (DUMIC) (1995), p. 204.
6. D. Carl, S. Schuchmann, M. Kilgore, R. Swope, and W. van den Hoek, in Proceedings of VLSI for Multilevel Interconnection Conference (VMIC) (1995), p. 97.
7. W. S. Yoo and R. Swope, J. Mater. Res. Soc. (accepted).
8. W. S. Yoo, R. Swope, and S. Schuchmann, in Proceedings of SEMICON Korea Technical Symposium (1996) (unpublished).