Dielectric properties of fluorinated silicon dioxide films

Journal of Non-Crystalline Solids

Volumn 240, Issue 1-3, 1998, Pages 154-165

  Hasegawa, S ^a   Tsukaoka, T ^a   Inokuma, T ^a   Kurata, Y ^a  

^a KANAZAWA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; HALOGENATION; ION BOMBARDMENT; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; SURFACE CHEMISTRY; TENSILE STRESS; WATER ABSORPTION;

FLUORINATION;

AMORPHOUS FILMS;

EID: 0032475699     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(98)00712-1     Document Type: Article

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