Plasma-enhanced chemical vapor deposition of zinc oxide at atmospheric pressure and low temperature

Solar Energy Materials and Solar Cells

Volumn 91, Issue 10, 2007, Pages 924-930

  Barankin, M D ^a   Gonzalez II, E ^a   Ladwig, A M ^a   Hicks, R F ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Al ZnO; PECVD; Transparent conducting oxide (TCO)

Indexed keywords

ALUMINUM; ATMOSPHERIC PRESSURE; DEPOSITION; TRANSPARENCY; ZINC OXIDE;

FILM RESISTIVITY; OPTICAL ABSORPTION COEFFICIENT; SUBSTRATE TEMPERATURE; TRANSPARENT-CONDUCTING OXIDE (TCO);

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 34147137073     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2007.02.009     Document Type: Article

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