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Journal of Materials Science

Volumn 45, Issue 23, 2010, Pages 6379-6388

Vacuum arc deposition of Al2O3-ZrO2 coatings: Arc behavior and coating characteristics

(6) Zukerman, I a,b Zhitomirsky, V N a Beit Ya'Akov, G a Boxman, R L a Raveh, A b Kim, S K c

a TEL AVIV UNIVERSITY (Israel)

b NRC Negev ^* (Israel)

c University of Ulsan (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNULAR ANODES; ARC BEHAVIOR; ARC CURRENT; ARC VOLTAGE; ARGON PRESSURE; CATHODE POISONING; CATHODE SPOT; CO-SUBSTRATE; COATING CHARACTERISTICS; COATING COMPOSITIONS; DEPOSITION CONDITIONS; DEPOSITION PARAMETERS; DEPOSITION TEMPERATURES; FAVORABLE CONDITIONS; FILTER CONFIGURATION; IN-VACUUM; ION CURRENTS; NEGATIVE BIAS; OXYGEN PRESSURE; PLANAR CATHODES; PLASMA BEAM; VACUUM ARC DEPOSITION; VACUUM ARC DEPOSITION SYSTEM; VISUAL OBSERVATIONS; WEAR BEHAVIORS;

ALUMINUM; ANNULAR DUCTS; ARGON; DEPOSITION; IONS; OXYGEN; PLASMAS; PROTECTIVE COATINGS; SUBSTRATES; VACUUM; VACUUM APPLICATIONS; VACUUM DEPOSITED COATINGS; WEAR RESISTANCE; ZIRCONIUM; ZIRCONIUM ALLOYS;

TUNGSTEN CARBIDE;

EID: 78149280374 PISSN: 00222461 EISSN: 15734803 Source Type: Journal
DOI: 10.1007/s10853-010-4734-7 Document Type: Conference Paper

Times cited : (15)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.