Characterization of Ti-Zr-N films deposited by cathodic vacuum arc with different substrate bias

Applied Surface Science

Volumn 254, Issue 13, 2008, Pages 3909-3914

  Niu, E W ^a   Li, L ^a   Lv, G H ^a   Chen, H ^a   Li, X Z ^a   Yang, X Z ^a   Yang, S Z ^a  

^a INSTITUTE OF PHYSICS   (China)

Author keywords

Cathodic vacuum arc; Nano scratch; Ti Zr N films

Indexed keywords

DEPOSITION; METALLIC FILMS; VACUUM APPLICATIONS;

CATHODIC VACUUM ARCS; NANO-SCRATCH; TI-ZR-N FILMS;

TITANIUM ALLOYS;

EID: 41749104451     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.12.022     Document Type: Article

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