Influence of gas entry point on plasma chemistry, ion energy and deposited alumina thin films in filtered cathodic arc

Plasma Chemistry and Plasma Processing

Volumn 27, Issue 5, 2007, Pages 599-608

  Rosen, J ^a   Persson, P O A ^a   Ionescu, M ^b   Pigott, J ^a   McKenzie, D R ^a   Bilek, M M M ^a  

^a UNIVERSITY OF SYDNEY   (Australia)

^b AUSTRALIAN NUCLEAR SCIENCE AND TECHNOLOGY ORGANISATION   (Australia)

Author keywords

Alumina; Cathodic arc; Gas entry point; Ion energy

Indexed keywords

ARGON ATMOSPHERE; CATHODIC ARC; GAS ENTRY POINT; ION ENERGY;

ALUMINA; FILM GROWTH; MEASUREMENT THEORY; THIN FILMS;

IONIZATION OF GASES;

EID: 34548425073     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11090-007-9088-9     Document Type: Article

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