Direct current magnetron sputtering deposition of nanocomposite alumina - zirconia thin films

Thin Solid Films

Volumn 516, Issue 23, 2008, Pages 8352-8358

  Trinh, D H ^a   Kubart, T ^b   Nyberg, T ^b   Ottosson, M ^b   Hultman, L ^a   Hogberg H ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b UPPSALA UNIVERSITY   (Sweden)

Author keywords

Alumina; Dual reactive direct current magnetron sputtering; Nanocomposite; Transmission electron microscopy; X ray diffraction; X ray photoelectron spectroscopy; Zirconia

Indexed keywords

ALUMINUM; ALUMINUM CLADDING; AMORPHOUS FILMS; LIGHT METALS; MAGNETRON SPUTTERING; MAGNETRONS; MOLECULAR ORBITALS; MOLECULAR SPECTROSCOPY; NONMETALS; ORE TREATMENT; OXIDES; OXYGEN; PHOTOELECTRON SPECTROSCOPY; REACTIVE SPUTTERING; SCALE (DEPOSITS); SPUTTER DEPOSITION; THICK FILMS; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIA; ZIRCONIUM;

ALUMINA; ALUMINA-ZIRCONIA; ALUMINIUM OXIDES; AMORPHOUS STRUCTURES; COLUMNAR STRUCTURES; DIRECT CURRENT MAGNETRON SPUTTERING; DUAL REACTIVE DIRECT CURRENT MAGNETRON SPUTTERING; KINETIC LIMITATIONS; MICROSTRUCTURAL CHARACTERISATION; MONOCLINIC ZIRCONIA; NANO COMPOSITES; NANOCOMPOSITE; OXYGEN GASES; PARTIAL PRESSURE CONTROL; STEADY-STATE CONDITIONS; STOICHIOMETRIC FILMS; TETRAGONAL ZIRCONIA; THIN FILMS; THIN SOLID FILMS; TRANSMISSION ELECTRON MICROSCOPY; X-RAY DIFFRACTION; ZIRCONIUM OXIDE FILMS; ZIRCONIUM OXIDES;

OXIDE FILMS;

EID: 50849110810     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.04.040     Document Type: Article

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