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Surface and Coatings Technology

Volumn 148, Issue 2-3, 2001, Pages 206-215

Characterization of nanostructured multiphase Ti-Al-B-N thin films with extremely small grain size

(4) Shtansky, D V a Kaneko, K b Ikuhara, Y c Levashov, E A a

a NATIONAL UNIVERSITY OF SCIENCE AND TECHNOLOGY MISIS (Russian Federation)

b JAPAN FINE CERAMICS CENTER (Japan)

c UNIVERSITY OF TOKYO (Japan)

Author keywords

Electron diffraction; Electron energy loss spectroscopy (EELS); Magnetron sputtering; Nanostructured thin films; Transmission electron microscopy (TEM); X Ray diffraction

Indexed keywords

AMORPHOUS MATERIALS; AUGER ELECTRON SPECTROSCOPY; COMPOSITE MATERIALS; ELECTRON ENERGY LOSS SPECTROSCOPY; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; HIGH RESOLUTION ELECTRON MICROSCOPY; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; PARTIAL PRESSURE; PHASE COMPOSITION; SUBSTRATES; TITANIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

MULTIPHASE FILMS;

THIN FILMS;

FILM;

EID: 0035803962 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(01)01341-X Document Type: Article

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