Ion current produced by a vacuum arc carbon plasma source

IEEE Transactions on Plasma Science

Volumn 29, Issue 5 I, 2001, Pages 776-780

  Zhitomirsky, Vladimir N ^b   Zarchin, Oren ^b   Wang, She Guan ^b   Boxman, Raymond L ^a,b   Goldsmith, Samuel ^b  

^a IEEE

^b TEL AVIV UNIVERSITY   (Israel)

Author keywords

Carbon plasma; Coatings; Plasma filter; Plasma measurements; Vacuum arcs

Indexed keywords

ANODES; CARBON; CATHODES; ELECTRIC ARCS; ELECTRIC CURRENTS; MAGNETIC FIELDS; POSITIVE IONS; VACUUM APPLICATIONS;

FOCUSING MAGNETIC FIELDS; INTERELECTRODE GAP LENGTH; ION CURRENT; TOROIDAL MAGNETIC FIELD; VACUUM ARC CARBON PLASMA SOURCE;

PLASMA SOURCES;

EID: 0035485504     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.964473     Document Type: Article

References (15)

1. Effect of vacuum arc deposition parameters on the properties of amorphous carbon thin films
2. Fabrication of amorphous diamond films
3. High-efficiency source of pure carbon plasma
4. Filtered arc deposition of amorphous diamond
5. Deposition of carbon films by a filtered cathodic arc
6. A study of filter transport mechanism in a filtered cathodic vacuum arcs
7. Effect of magnetic field near the cathode on the arc spot stability of filtered vacuum arc source of graphite
8. Unstable arc operation and cathode spot motion in a magnetically filtered vacuum arc deposition system
9. Role of the magnetic field in the cathode region during vacuum arc operation
10. Vacuum arc ion currents and electrode phenomena
11. Erosion and ionization in the cathode spot regions of vacuum arcs
12. The numerical calculation of plasma beam propagation in a toroidal duct with magnetized electrons and unmagnetized ions
13. Transport of plasma streams in a curvilinear plasma-optics system
14. Effect of duct bias on transport of vacuum plasmas through curved magnetic filters
15. Interactions of the directed plasma from a cathodic arc with electrodes and magnetic fields