Cathodic arc plasma deposition of nano-multilayered Zr-O/Al-O thin films

Surface and Coatings Technology

Volumn 204, Issue 11, 2010, Pages 1697-1701

  Kim, Sun Kyu ^a   Van Le, Vinh ^a   Boxman, R L ^b   Zhitomirsky, V N ^b   Lee, Jeong Yong ^c  

^a University of Ulsan   (South Korea)

^b TEL AVIV UNIVERSITY   (Israel)

^c Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Alumina; Cathodic arc plasma deposition; Nano layered films; Zirconia

Indexed keywords

ARC CURRENT; CATHODE CURRENTS; CATHODIC ARC PLASMA DEPOSITION; CATHODIC ARC PLASMA DEPOSITION SYSTEM; FILM STRUCTURE; GOOD CORRELATIONS; HARDNESS ENHANCEMENT; HRTEM MICROSCOPY; LAYERED FILMS; LAYERED STRUCTURES; MULTI-LAYERED; NANO-LAYERED FILMS; NEGATIVE BIAS; SUBSTRATE BIAS;

ALUMINUM; CATHODES; CAVITY RESONATORS; CRYSTALLITES; DEPOSITION; ELECTRIC ARCS; HARDNESS; MAGNETRONS; MARTENSITIC STAINLESS STEEL; MECHANICAL PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SUBSTRATES; THIN FILMS; TOOL STEEL; ZIRCONIA; ZIRCONIUM;

PLASMA DEPOSITION;

EID: 74849123140     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.10.037     Document Type: Article

References (20)

1. Sproul W.D. Science 273 (1996) 889
2. Chatfield C., Lindstrom J.N., and Sjostrand M.E. J. Physique 50 (1989) 377
3. Leckie R.M., Kramer S., Ruhle M., and Levi C.G. Acta Mater. 53 (2005) 3281
4. Vasiliev A.L., Padture N.P., and Ma X. Acta Mater. 54 (2006) 4913
5. Chen A., Chen C., Zhang L., Qi B., and Lei T.-Q. Surf. Rev. Lett. 13 (2006) 545
6. Movchan M., and Rudoy Y. Mater. Design 19 (1998) 253
7. Trinh D.H., Högberg H., Andersson J.M., Collin M., Reineck I., Helmersson U., and Hultman L. J. Vac. Sci. Technol. A 24 (2006) 309
8. Trinh D.H., Kubart T., Nyberg T., Ottonsson M., Hultman L., and Högberg H. Thin Solid Films 516 (2008) 8352
9. Bjormander C. Surf. Coat. Technol. 201 (2006) 4032
10. Aita C.R. Surf. Coat. Technol. 188-189 (2004) 179
11. Scanlan C.M., Gajdardziska-Josifovska M., Wiggins M.D., and Aita C.R. Proc. Mater. Res. Soc. 343 (1994) 481
12. Gajdardziska-Josifovska M., and Aita C.R. J. Appl. Phys. 79 (1996) 1315
13. Aita C.R., Wiggins M.D., Whig R., Scanlan C.M., and Gajdardziska-Josifovska M. J. Appl. Phys. 79 (1996) 1176
14. Schofield M., Gajdardziska-Josifovska M., Aita C.R., and Rice P.M. Thin Solid Films 326 (1998) 106
15. Schofield M., Gajdardziska-Josifovska M., Aita C.R., and Rice P.M. Thin Solid Films 326 (1998) 117
16. Teixeira V., Monteiro A., Duarte J., and Portinha A. Vacuum 67 (2002) 477
17. Gao P., Meng L.J., dos Santos M.P., Teixeira V., and Andritschky M. Vacuum 64 (2002) 267
18. Portinha A., Teixeire V., Carneiro J.O., Dup S.N., Shmegera R., and Tavares C.J. Surf. Coat. Technol. 200 (2005) 765
19. Klug H.P., and Alexander L.E. X-ray Diffraction Procedures (1974), Wiley, New York
20. Ohring M. The Materials Science of Thin Films. 2st Ed (2002), Academic Press Inc, San Diego Chapter 12