Crystal structure characterisation of filtered arc deposited alumina coatings: Temperature and bias voltage

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 606-610

  Brill, R ^a   Koch, F ^a   Mazurelle, J ^a   Levchuk, D ^a   Balden, M ^a   Yamada Takamura, Y ^b   Maier, H ^a   Bolt, H ^a  

^a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

Alumina coatings; Filtered vacuum arc deposition; Hydrogen permeation barrier

Indexed keywords

COATINGS; CRYSTAL STRUCTURE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; STOICHIOMETRY; TRANSMISSION ELECTRON MICROSCOPY; VACUUM APPLICATIONS; X RAY DIFFRACTION ANALYSIS;

VACUUM ARC DEPOSITION DEVICES;

ALUMINA;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 0041827127     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00539-5     Document Type: Article

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