Influence of substrate bias on the structure and properties of ZrN films deposited by cathodic vacuum arc

Materials Science and Engineering: A

Volumn 460-461, Issue , 2007, Pages 135-139

  Niu, E W ^a   Li, L ^a   Lv, G H ^a   Chen, H ^a   Feng, W R ^a   Fan, S H ^a   Yang, S Z ^a   Yang, X Z ^a  

^a INSTITUTE OF PHYSICS   (China)

Author keywords

Cathodic vacuum arc; Substrate bias; ZrN films

Indexed keywords

CRYSTAL STRUCTURE; DEPOSITION RATES; ELASTIC MODULI; GRAIN SIZE AND SHAPE; HARDNESS; METALLIC FILMS; RESIDUAL STRESSES; SUBSTRATES; SURFACE MORPHOLOGY; SURFACE ROUGHNESS;

CATHODIC VACUUM ARC; SUBSTRATE BIAS;

ZIRCONIUM COMPOUNDS;

CRYSTAL STRUCTURE; DEPOSITION RATES; ELASTIC MODULI; GRAIN SIZE AND SHAPE; HARDNESS; METALLIC FILMS; RESIDUAL STRESSES; SUBSTRATES; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; ZIRCONIUM COMPOUNDS;

EID: 34247095149     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.msea.2007.02.085     Document Type: Article

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