Virtual metrology for run-to-run control in semiconductor manufacturing

Expert Systems with Applications

Volumn 38, Issue 3, 2011, Pages 2508-2522

  Kang, Pilsung ^a   Kim, Dongil ^a   Lee, Hyoung Joo ^b   Doh, Seungyong ^c   Cho, Sungzoon ^a  

^a Seoul National University   (South Korea)

^b UNIVERSITY OF OXFORD   (United Kingdom)

^c SAMSUNG Electronics   (South Korea)

Author keywords

Data mining; Exponentially weighted moving average controller; Photolithography; Process control; Run to run control; Semiconductor manufacturing; Virtual metrology

Indexed keywords

DATA MINING TECHNIQUES; EXPONENTIALLY WEIGHTED MOVING AVERAGE; EXPONENTIALLY WEIGHTED MOVING AVERAGE CONTROLLERS; MANUFACTURING PROCESS; PREDICTION MODEL; PROCESS INPUTS; PRODUCTION EQUIPMENTS; RUN-TO-RUN CONTROL; SEMICONDUCTOR MANUFACTURING; SEMICONDUCTOR MANUFACTURING PROCESS; SENSOR DATA; SIMULATION RESULT; VIRTUAL METROLOGY;

COMPUTER SIMULATION; CONTROL THEORY; CONTROLLERS; DATA MINING; FORECASTING; INDUSTRIAL ENGINEERING; MANUFACTURE; MATHEMATICAL MODELS; MEASUREMENTS; PHOTOLITHOGRAPHY; PRODUCTION ENGINEERING; PRODUCTIVITY; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS;

PROCESS CONTROL;

EID: 78049530300     PISSN: 09574174     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.eswa.2010.08.040     Document Type: Article

References (32)

1. S. Adivikolanu, and E. Zafiriou Extensions and performance/robustness tradeoffs of the EWMA run-to-run controller by using the internal model control structure IEEE Transactions on Electronics Packaging Manufacturing 23 1 2000 56 68
2. M. Anderson, and C.K. Hanish An evaluation of the benefits of integrating run-to-run control with scheduling and dispatching systems IEEE Transactions on Semiconductor Manufacturing 20 4 2007 386 392
3. M.J. Berry, and G.S. Linoff Mastering Data Mining 2000 Wiley & Sons New York, NY, USA
4. Besnard, J.; & Toprac, A. (2006). Wafer-to-wafer virtual metrology applied to run-to-run control. In: Proceedings of the third ISMI Symposium on Manufacturing Effectiveness, Austin, TX, USA.
5. C.M. Bishop Neural Networks for Pattern Recognition 1995 Oxford University Press New York, NY, USA
6. C. Bode, B. Ko, and T. Edgar Run-to-run control and performance monitoring of overlay in semiconductor manufacturing Control Engineering Practice 12 7 2004 893 900
7. M. Boin, and W. Lerch New methods of metrology data analysis during semiconductor processing and application to rapid thermal processing Materials Science in Semiconductor Processing 1 3-4 1998 195 200
8. B.D. Bunday, J.A. Allgair, M. Caldwell, E.P. Solecky, C.N. Archie, and B.J. Rice Value-added metrology IEEE Transactions on Semiconductor Manufacturing 20 3 2007 266 277
9. D.E. Castillo, and J.-Y. Yeh An adaptive run-to-run optimizing controller for linear andnonlinear semiconductor processes IEEE Transactions on Semiconductor Manufacturing 11 2 1998 285 295
10. Chang, Y.-J.; Kang, Y.; Hsu, C.-L.; Chang, C.-T.; Chan, T.Y. (2006). Virtual metrology technique for semiconductor manufacturing. In: Proceedings of international joint conference on neural networks (IJCNN 2006), Vancouver, Canada. pp. 5289-5293.
11. C.E. Chemali, J. Freudenberg, M. Hankinson, and J.J. Bendik Run-to-run criticial dimension and sidewall angle lithography control using the PROLITH simulator IEEE Transactions on Semiconductor Manufacturing 17 3 2004 388 401
12. Chen, P.; Wu, S.; Lin, J.; Ko, F.; Lo, H.; Wang, J.; et al. (2005). Virtual metrology: A solution for wafer to wafer advanced process control. In: Proceedings of IEEE international symposium on semiconductor manufacturing (ISSM 2005), San Jose, CA, USA. pp. 155-157.
13. Chen, Y.-T.; Yang, H.-C.; & Cheng, F.-T. (2006). Multivariate simulation assessment for virtual metrology. In: Proceedings of international conference on robotics and automation (ICRA 2006), Orlando, FL, USA. pp. 1049-1053.
14. Cheng, C.Y. & Cheng, F.-T.; 2005. Application development of virtual metrology in semiconductor industry. In: Proceedings of the 31st annual conference of IEEE industrial electronics society (IECON 2005), Raleigh, NC, USA pp. 124-129.
15. F.-T. Cheng, Y.-T. Chen, Y.-C. Su, and D.-L. Zeng Evaluating reliance level of a virtual metrology system IEEE Transactions on Semiconductor Manufacturing 21 1 2008 92 103
16. F.-T. Cheng, H.-C. Huang, and C.-A. Kao Dual-phase virtual metrology scheme IEEE Transactions on Semiconductor Manufacturing 20 4 2007 566 571
17. E.S. Hamby, P.T. Kabamba, and P.P. Khargonekar A probabilistic approach to run-to-run control IEEE Transactions on Semiconductor Manufacturing 11 4 1998 654 669
18. P. Kang, and S. Cho Locally linear reconstruction for instance-based learning Pattern Recognition 41 11 2008 3507 3518
19. A.A. Khan, J.R. Moyne, and D.M. Tilbury An approach for factory-wide control utilizing virtual metrology IEEE Transactions on Semiconductor Manufacturing 20 4 2007 364 375
20. S. Limanond, J. Si, and K. Tsakalis Monitoring and control of semiconductor manufacturing processes IEEE Control Systems Magazine 18 6 1998 46 58
21. Lin, T.-H.; Hung, M.-H.; Lin, R.-C.; & Cheng, F.-T.; (2006). A virtual metrology scheme for predicting CVD thickness in semiconductor manufacturing. In: Proceedings of international conference on robotics and automation (ICRA 2006), Orlando, FL, USA. pp. 1054-1509.
22. S.-J. Park, M.-S. Lee, S.-Y. Shin, K.-H. Cho, J.-T. Lim, and B.-S. Cho Run-to-run overlay control of steppers in semiconductor manufacturing systems IEEE Transactions on Semiconductor Manufacturing 18 4 2005 605 613
23. N.S. Patel, and S.T. Jenkins Adaptive optimization of run-to-run controllers: The EWMA example IEEE Transactions on Semiconductor Manufacturing 13 1 2000 97 107
24. S.J. Qin, G. Cherry, R. Good, J. Wang, and C.A. Harrison Semiconductor manufacturing process control and monitoring: A fab-wide framework Journal of Process Control 16 3 2006 179 191
25. S.M. Ross Introduction to Probability and Statistic for Engineers and Scientists 2004 Academic Press San Diego, CA, USA
26. T.H. Smith, and D.S. Boning A self-tuning EWMA controller utilizing artificial neural network function approximation techniques IEEE Transactions on Components, Packaging, and Manufacturing Technology-Part C 20 2 1997 121 132
27. A.J. Smola, and B. Schölkopf A tutorial on support vector regression Statistics and Computing 14 3 2004 199 222
28. A.-J. Su, J.-C. Jeng, H.-P. Huang, C.-C. Yu, S.-Y. Hung, and C.-K. Chao Control relevant issues in semiconductor manufacturing: Overview with some new results Control Engineering Practice 15 10 2007 1268 1279
29. H. Tsuda, and H. Shirai Improvement of photolithography process by second generation data mining IEEE Transactions on Semiconductor Manufacturing 20 3 2007 239 244
30. J. Wang, and Q.P. He A bayesian approach for disturbance detection and classification and its application to state estimation in run-to-run control IEEE Transactions on Semiconductor Manufacturing 20 2 2007 126 136
31. X.A. Wang, and R. Mahajan Artificial neural network model-based run-to-run process controller IEEE Transactions on Components, Packaging, and Manufacturing Technology-Part C 19 1 1996 19 26
32. J. Yi, Y. Sheng, and C. Xu Neural network based uniformity profile control of linear chemical-mechanical planarization IEEE Transactions on Semiconductor Manufacturing 16 4 2003 609 620