Run-to-run critical dimension and sidewall angle lithography control using the PROLITH simulator

IEEE Transactions on Semiconductor Manufacturing

Volumn 17, Issue 3, 2004, Pages 388-401

  Chemali, Chadi El ^a   Freudenberg, Jim ^b   Hankinson, Matt ^c   Bendik, Joseph J ^d  

^a FREESCALE SEMICONDUCTOR INC   (United States)

^b UNIVERSITY OF MICHIGAN   (United States)

^c KLA TENCOR CORPORATION   (United States)

^d Dynamic Intelligence Inc   (United States)

Author keywords

Critical dimension control; Kalman filtering; Process modeling; Run to run control; Sidewall angle control

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPUTER SIMULATION; FEEDBACK CONTROL; INTEGRATED CIRCUITS; KALMAN FILTERING; MICROELECTRONICS; PHOTOLITHOGRAPHY; PHOTORESISTORS; SCANNING ELECTRON MICROSCOPY;

CRITICAL DIMENSION CONTROL; PROCESS MODELING; RUN-TO-RUN CONTROL; SIDEWALL ANGLE CONTROL;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 4344671273     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2004.831530     Document Type: Conference Paper

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