Monitoring and Control of Semiconductor Manufacturing Processes

IEEE Control Systems

Volumn 18, Issue 6, 1998, Pages 46-58

  Limanond, Suttipan ^a   Si, Jennie ^a   Tsakalis, Kostas ^a  

^a ARIZONA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; CHEMICAL VAPOR DEPOSITION; COST EFFECTIVENESS; ETCHING; INTEGRATED CIRCUIT MANUFACTURE; LITHOGRAPHY; PROCESS CONTROL; VLSI CIRCUITS;

CHEMICAL MECHANICAL POLISHING (CMP);

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032288356     PISSN: 1066033X     EISSN: None     Source Type: Journal    
DOI: 10.1109/37.736011     Document Type: Article

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