A probabilistic approach to run-to-run control

IEEE Transactions on Semiconductor Manufacturing

Volumn 11, Issue 4, 1998, Pages 654-669

  Hamby, Eric S ^a   Kabamba, Pierre T ^a,b   Khargonekar, Pramod P ^a,b  

^a UNIVERSITY OF MICHIGAN   (United States)

^b IEEE   (United States)

Author keywords

EWMA; Robust process control; Run to run control

Indexed keywords

ALGORITHMS; CONTROL SYSTEMS; MATHEMATICAL MODELS; MONTE CARLO METHODS; PLASMA ETCHING; PROBABILITY; PROBABILITY DISTRIBUTIONS; PROCESS CONTROL;

EXPONENTIALLY WEIGHTED MOVING AVERAGE; PROBABILITY OF PERFORMANCE; PROBABILITY OF STABILITY; RUN TO RUN CONTROL;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032205066     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.728563     Document Type: Article

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