Run-to-run overlay control of steppers in semiconductor manufacturing systems based on history data analysis and neural network modeling

IEEE Transactions on Semiconductor Manufacturing

Volumn 18, Issue 4, 2005, Pages 605-612

  Park, Seong Jin ^a,b   Lee, Moon Sang ^a,c   Shin, Sung Young ^a,d   Cho, Kwang Hyun ^a,e,g,h,i,j   Lim, Jong Tae ^a,f,i   Cho, Bong Su ^c   Jei, Young Ho ^c   Kim, Myung Kil ^c   Park, Chan Hoon ^c,k  

^a Ajou University ^*

^b Ajou University   (South Korea)

^c SAMSUNG Electronics   (South Korea)

^d University of Ulsan   (South Korea)

^e Seoul National University   (South Korea)

^f Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^g Systems Biology Laboratory   (South Korea)

^h IEE   (South Korea)

ⁱ Technical Society of Control and Instrument   (South Korea)

^j ICASE   (United States)

^k Photolithography Technology of Semiconductor FAB

more..

Author keywords

History data; Neural networks; Overlay control; Photolithography; Steppers

Indexed keywords

CONTROL SYSTEMS; DATA REDUCTION; NEURAL NETWORKS; PHOTOLITHOGRAPHY; SILICON WAFERS;

HISTORY DATA; OVERLAY CONTROL; STEPPERS;

SEMICONDUCTOR MATERIALS;

EID: 28644443332     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2005.858530     Document Type: Conference Paper

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