Value-added metrology

IEEE Transactions on Semiconductor Manufacturing

Volumn 20, Issue 3, 2007, Pages 266-276

  Bunday, Benjamin D ^a   Allgair, John A ^a   Caldwell, Mark ^b   Solecky, Eric P ^c   Archie, Charles N ^c   Rice, Bryan J ^a   Singh, Bhanwar ^d   Cain, Jason P ^d   Emami, Iraj ^d  

^a SEMATECH   (United States)

^b FREESCALE SEMICONDUCTOR INC   (United States)

^c IBM MICROELECTRONICS   (United States)

^d ADVANCED MICRO DEVICES   (United States)

Author keywords

Advanced process control (APC); Critical dimension (CD); Design for manufacturability (DFM); Design based metrology (DBM); ISMI; Metrology; Optical proximity correction (OPC)

Indexed keywords

ETCHING; LITHOGRAPHY; MEASUREMENTS; PROCESS CONTROL;

ADVANCED PROCESS CONTROL (APC); CRITICAL DIMENSION (CD); DESIGN FOR MANUFACTURABILITY (DFM); DESIGN-BASED METROLOGY (DBM); OPTICAL PROXIMITY CORRECTION (OPC);

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 34547760274     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2007.901851     Document Type: Conference Paper

References (13)

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