Improvement of photolithography process by second generation data mining

IEEE Transactions on Semiconductor Manufacturing

Volumn 20, Issue 3, 2007, Pages 239-244

  Tsuda, Hidetaka ^a   Shirai, Hidehiro ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

Advanced process control (APC); Correlation; Second generation data mining; Tool log data

Indexed keywords

DATA MINING; PARAMETER ESTIMATION; PROBLEM SOLVING; PRODUCTIVITY; RELATIONAL DATABASE SYSTEMS;

ADVANCED PROCESS CONTROL (APC); SECOND GENERATION DATA MINING; TOOL LOG DATA;

PHOTOLITHOGRAPHY;

EID: 34547779924     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2007.901839     Document Type: Conference Paper

References (4)

1. R. Agrawal, T. Imilienski, and A. Swami, in Proc ACM SIGMOD Int. Conf. Management of Data, May 1993, pp. 207-216.
2. Mieno, Sato, Shibuya, Odagiri, Tsuda, and Take, "Yield improvement using data mining system," Proc. ISSM'99.
3. Tsuda, Shirai, Takagi, and Take, "Yield analysis and improvement by reducing manufacturing fluctuation noise," Proc ISSM'2000.
4. Kawamura, Tsuda, Shirai, Oishi, andina, "Log data extraction and correlation miner for lithography management system: LMS-LEC," Proc. SPIE 2005.