An adaptive run-to-run optimizing controller for linear and nonlinear semiconductor processes

IEEE Transactions on Semiconductor Manufacturing

Volumn 11, Issue 2, 1998, Pages 285-295

  Del Castillo, Enrique ^a   Yeh, Jinn Yi ^b  

^a University of Texas at Arlington   (United States)

^b HUNGKUANG UNIVERSITY   (Taiwan)

Author keywords

Adaptive control; Chemical mechanical planarization; Process optimization; Run to run control

Indexed keywords

ADAPTIVE CONTROL SYSTEMS; ALGORITHMS; CONTROL NONLINEARITIES; IDENTIFICATION (CONTROL SYSTEMS); MATHEMATICAL MODELS; OPTIMAL CONTROL SYSTEMS; OPTIMIZATION; PROCESS CONTROL; QUALITY CONTROL;

CHEMICAL MECHANICAL PLANARIZATION; OPTIMIZING ADAPTIVE QUALITY CONTROLLER; RUN TO RUN OPTIMIZING CONTROLLER;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032070696     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.670178     Document Type: Article

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