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Journal of Materials Chemistry

Volumn 20, Issue 44, 2010, Pages 9962-9967

Non-sticky silicate replica mold by phase conversion approach for nanoimprint lithography applications

(6) Park, Sungjune a Park, Hyun Ha b Han, Oc Hee b,c Chae, Seen Ae c Lee, Duhyun d Kim, Dong Pyo b

a RWTH AACHEN UNIVERSITY (Germany)

b Chungnam National University (South Korea)

c Korea Basic Science Institute (KBSI) (South Korea)

d Samsung Advanced Institute of Technology (SAIT) (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ECONOMIC EFFICIENCY; HIGH DURABILITY; HIGH MECHANICAL STRENGTH; HIGH-THROUGHPUT; LOW ADHESION; MOLD FABRICATION; NANO-DEVICES; NANO-IMPRINT; PHASE CONVERSION; PHYSICAL CONTACTS; SUB-100 NM; SURFACE MODIFICATION; UV- AND;

FABRICATION; INORGANIC POLYMERS; MECHANICAL PROPERTIES; MOLDS; SILICATES;

NANOIMPRINT LITHOGRAPHY;

EID: 78049380763 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/c0jm01760d Document Type: Article

Times cited : (19)

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