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Current Applied Physics

Volumn 11, Issue 1, 2011, Pages 43-49

Micro-structural and optical properties of reactive magnetron sputtered Aluminum Nitride (AlN) nanostructured films

(3) Subramanian, B a Swaminathan, V b Jayachandran, M a

a CENTRAL ELECTROCHEMICAL RESEARCH INSTITUTE (India)

b NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

Author keywords

AFM; Aluminium nitride; Films; TEM; XPS

Indexed keywords

AFM; ALN; ALN FILMS; ALUMINIUM NITRIDE; DIRECT BAND GAP; DIRECT CURRENT; GLASS SUBSTRATES; HEXAGONAL WURTZITE STRUCTURE; MAGNETRON-SPUTTERED ALUMINUM; MICRO-STRUCTURAL; NANO-STRUCTURED; NANOSTRUCTURED FILMS; OPTICAL ABSORPTION STUDIES; PHOTOELECTRON PEAKS; REACTIVE MAGNETRON SPUTTERING; SEM; SI(1 0 0); SPHERICAL GRAINS; TEM; VISIBLE REGION; XPS; XRD ANALYSIS;

ALUMINUM; ATOMIC FORCE MICROSCOPY; GAS ABSORPTION; MATERIALS PROPERTIES; NITRIDES; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC SULFIDE;

ALUMINUM NITRIDE;

EID: 77957280501 PISSN: 15671739 EISSN: None Source Type: Journal
DOI: 10.1016/j.cap.2010.06.016 Document Type: Article

Times cited : (16)

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