AlN thin films deposited by pulsed laser ablation, sputtering and filtered arc techniques

Thin Solid Films

Volumn 398, Issue 399, 2001, Pages 575-580

  Bathe, R ^a   Vispute, R D ^a   Habersat, Dan ^b   Sharma, R P ^b   Venkatesan, T ^a   Scozzie, C J ^c   Ervin, Matt ^c   Geil, B R ^c   Lelis, A J ^c   Dikshit, S J ^d   Bhattacharya, R ^d  

^a Bldg 142   (United States)

^b US Army Research Laboratory ^*

^c U S ARMY RESEARCH LABORATORY   (United States)

^d UES INC   (United States)

Author keywords

AlN films; Arc deposition; Conformal deposition; High temperature high power electronics; Pulsed laser deposition; Sputtering

Indexed keywords

ALUMINUM NITRIDE; ATOMIC FORCE MICROSCOPY; DIELECTRIC FILMS; MAGNETRON SPUTTERING; PASSIVATION; PULSED LASER DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; ULTRAVIOLET SPECTROSCOPY; X RAY DIFFRACTION ANALYSIS;

ION CHANNELING SPECTROMETRY;

THIN FILMS;

EID: 0035507144     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01321-9     Document Type: Article

References (13)

1. Silicon carbide and related materials: 1999, part I-II