Chemical structure of films grown by AlN laser ablation: An X-ray photoelectron spectroscopy study

Surface and Coatings Technology

Volumn 122, Issue 2-3, 1999, Pages 242-246

  Laidani, N ^a   Vanzetti, L ^a   Anderle, M ^a   Basillais, A ^b   Boulmer Leborgne, C ^b   Perriere, J ^c  

^a ITCIrst   (Italy)

^b UNIVERSITÉ D'ORLÉANS   (France)

^c INSTITUT DES NANOSCIENCES DE PARIS   (France)

Author keywords

AlN films; Pulsed laser deposition; X ray photoelectron spectroscopy

Indexed keywords

EID: 0001077631     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00377-1     Document Type: Article

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