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Journal of Photopolymer Science and Technology

Volumn 20, Issue 6, 2007, Pages 793-797

Synthesis, characterization and lithography performance of novel anionic photoacid generator (PAG) bound polymers

(5) Wang, Mingxing a Tang, Mingzhen a Her, Tsing Hua a Yueh, Wang b Gonsalves, Kenneth E a

a UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE (United States)

b INTEL CORPORATION (United States)

Author keywords

Anionic PAG; Chemically amplified resist (CAR); Lithography; Photoacid generator (PAG); Polymer resist

Indexed keywords

EID: 38549084277 PISSN: 09149244 EISSN: 13496336 Source Type: Journal
DOI: 10.2494/photopolymer.20.793 Document Type: Article

Times cited : (11)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.