PAG segregation during exposure affecting innate material roughness

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7273, Issue , 2009, Pages

  Fedynyshyn, Theodore H ^a   Astolfi, David K ^a   Cabral, Alberto ^a   Cann, Susan ^a   Pottebaum, Indira ^a   Roberts, Jeanette M ^b  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

Linewidth roughness; PAG; Photoresist; Polymer

Indexed keywords

AFM; DISSOLUTION RATES; HYDROXYSTYRENE; INHOMOGENEITY; LINEWIDTH ROUGHNESS; NANO SCALE; NON-POLYMERIC; PAG;

DISSOLUTION; PHOTORESISTORS; SEGREGATION (METALLOGRAPHY); SURFACE TREATMENT;

POLYMERS;

EID: 65849287308     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814811     Document Type: Conference Paper

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