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Volumn , Issue , 2009, Pages 585-592

Critical issues of 3D high-performance IC integrations

Author keywords

3D IC integration; MEOL; Solder microbumps; Thermal management; Thin wafer handling; TSV with RDL

Indexed keywords

HIGH-PERFORMANCE IC; MEOL; MICRO-BUMPS; MICROELECTRONIC INDUSTRY; POTENTIAL SOLUTIONS; RESEARCH PROBLEMS; THIN WAFERS; TSV WITH RDL;

EID: 77955210944     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (9)

References (27)
  • 12
    • 0036601273 scopus 로고    scopus 로고
    • Effect of process parameters on the surface morphology and mechanical performance of silicon surfaces after deep reactive ion etching (DRIE)
    • Chen, K. S., Ayon, A. A., Zhang, X., and Spearing, S. M. "Effect of process parameters on the surface morphology and mechanical performance of silicon surfaces after deep reactive ion etching (DRIE)." J. Microelectromech. Syst. 11:264-275, 2002.
    • (2002) J. Microelectromech. Syst. , vol.11 , pp. 264-275
    • Chen, K.S.1    Ayon, A.A.2    Zhang, X.3    Spearing, S.M.4
  • 14
    • 47349100893 scopus 로고    scopus 로고
    • Package technology to address the memory bandwidth challenge for tera-scale computing
    • Hu, G., Kalyanam, H., Krishnamoorthy, S., and Polka, L. "Package technology to address the memory bandwidth challenge for tera-scale computing." INTEL Technol. J. 11:197-206, 2007.
    • (2007) INTEL Technol. J. , vol.11 , pp. 197-206
    • Hu, G.1    Kalyanam, H.2    Krishnamoorthy, S.3    Polka, L.4
  • 25
    • 84876932522 scopus 로고    scopus 로고
    • www.3m.com/electronicmaterial.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.