SCOPUS 정보 검색 플랫폼

Japanese Journal of Applied Physics

Volumn 49, Issue 3 PART 1, 2010, Pages

Metalorganic chemical vapor deposition of Al2O3 thin films from dimethylaluminumhydride and O2

(4) He, Gang a Wang, Xiaoliang a Oshima, Masaharu a Shimogaki, Yukihiro a

a UNIVERSITY OF TOKYO (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AL2O3 FILMS; HIGH QUALITY; HIGH REFRACTIVE INDEX; HIGH-K GATE DIELECTRICS; INTERFACIAL LAYER; INTERFACIAL-LAYER THICKNESS; KINETIC BEHAVIOR; LANGMUIR HINSHELWOOD MECHANISM; LOW CARBON; LOW DEPOSITION TEMPERATURE; METALORGANIC CHEMICAL VAPOR DEPOSITION; MOCVD; OXYGEN PARTIAL PRESSURE; PROCESS OPTIMIZATION; SI SUBSTRATES; SUBSTRATE TEMPERATURE;

ALUMINUM; GATE DIELECTRICS; GATES (TRANSISTOR); GROWTH KINETICS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OPTIMIZATION; ORGANIC POLYMERS; OXYGEN; REFRACTIVE INDEX; THIN FILMS;

CARBON FILMS;

EID: 77954004784 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.49.031502 Document Type: Article

Times cited : (11)

References (34)

1
- 0035872897
- G. D. Wilk, R. M. Wallace, and J. M. Anthony: J. Appl. Phys. 89 (2001) 5243.
- (2001) J. Appl. Phys. , vol.89 , pp. 5243
- Wilk, G.D.¹ Wallace, R.M.² Anthony, J.M.³

2
- 2142807339
- S. Toyoda, J. Okabayashi, H. Kumigashira, M. Oshima, K. Ono, M. Niwa, K. Usuda, and G. L. Liu: Appl. Phys. Lett. 84 (2004) 2328.
- (2004) Appl. Phys. Lett. , vol.84 , pp. 2328
- Toyoda, S.¹ Okabayashi, J.² Kumigashira, H.³ Oshima, M.⁴ Ono, K.⁵ Niwa, M.⁶ Usuda, K.⁷ Liu, G.L.⁸

3
- 33846204392
- W. W. Wang, T. Nabatame, and Y. Shimogaki: J. Electrochem. Soc. 154 (2007) G25.
- (2007) J. Electrochem. Soc. , vol.154
- Wang, W.W.¹ Nabatame, T.² Shimogaki, Y.³

4
- 36949027321
- G. He, G. W. Meng, L. D. Zhang, and M. Liu: Appl. Phys. Lett. 91 (2007) 232910
- (2007) Appl. Phys. Lett. , vol.91 , pp. 232910
- He, G.¹ Meng, G.W.² Zhang, L.D.³ Liu, M.⁴

5
- 12444251122
- G. He, M. Liu, L. Q. Zhu, M. Chang, Q. Fang, and L. D. Zhang: Surf. Sci. 576 (2005) 67.
- (2005) Surf. Sci. , vol.576 , pp. 67
- He, G.¹ Liu, M.² Zhu, L.Q.³ Chang, M.⁴ Fang, Q.⁵ Zhang, L.D.⁶

6
- 0035831847
- I. Pallecchi, G. Grassano, D. Marre, L. Pellegrino, M. Putti, and A. S. Siri: Appl. Phys. Lett. 78 (2001) 2244.
- (2001) Appl. Phys. Lett. , vol.78 , pp. 2244
- Pallecchi, I.¹ Grassano, G.² Marre, D.³ Pellegrino, L.⁴ Putti, M.⁵ Siri, A.S.⁶

7
- 0034454056
- D. A. Buchanan, E. P. Gusev, E. Cartier, H. Okorn-Schmidt, K. Rim, M. A. Gribelyuk, A. Mocuta, A. Ajmera, M. Copel, S. Guha, N. Bojarczuk, A. Callegari, C. D'Emic, P. Kozlowski, K. Chan, R. J. Fleming, P. C. Jamison, J. Brown, and R. Arndt: IEDM Tech. Dig., 2000, p. 223.
- (2000) IEDM Tech. Dig. , pp. 223
- Buchanan, D.A.¹ Gusev, E.P.² Cartier, E.³ Okorn-Schmidt, H.⁴ Rim, K.⁵ Gribelyuk, M.A.⁶ Mocuta, A.⁷ Ajmera, A.⁸ Copel, M.⁹ Guha, S.¹⁰ Bojarczuk, N.¹¹ Callegari, A.¹² D'Emic, C.¹³ Kozlowski, P.¹⁴ Chan, K.¹⁵ Fleming, R.J.¹⁶ Jamison, P.C.¹⁷ Brown, J.¹⁸ Arndt, R.¹⁹

8
- 0035848173
- M. Kundu, N. Miyata, and M. Ichikawa: Appl. Phys. Lett. 78 (2001) 1517.
- (2001) Appl. Phys. Lett. , vol.78 , pp. 1517
- Kundu, M.¹ Miyata, N.² Ichikawa, M.³

9
- 0035394073
- R. S. Johnson, G. Lucovsky, and I. Baumvol: J. Vac. Sci. Technol. A 19 (2001) 1353.
- (2001) J. Vac. Sci. Technol. A , vol.19 , pp. 1353
- Johnson, R.S.¹ Lucovsky, G.² Baumvol, I.³

10
- 79955998808
- S. Guha, E. P. Gusev, H. Okorn-Schmidt, M. Copel, L.-A. Ragnarsson, and N. A. Bojarczuk: Appl. Phys. Lett. 81 (2002) 2956.
- (2002) Appl. Phys. Lett. , vol.81 , pp. 2956
- Guha, S.¹ Gusev, E.P.² Okorn-Schmidt, H.³ Copel, M.⁴ Ragnarsson, L.-A.⁵ Bojarczuk, N.A.⁶

11
- 79955987885
- H. Y. Yu, M. F. Li, B. J. Cho, C. C. Yeo, M. S. Joo, D. L. Kwong, J. S. Pan, C. H. Ang, J. Z. Zheng, and S. Ramanathan: Appl. Phys. Lett. 81 (2002) 376.
- (2002) Appl. Phys. Lett. , vol.81 , pp. 376
- Yu, H.Y.¹ Li, M.F.² Cho, B.J.³ Yeo, C.C.⁴ Joo, M.S.⁵ Kwong, D.L.⁶ Pan, J.S.⁷ Ang, C.H.⁸ Zheng, J.Z.⁹ Ramanathan, S.¹⁰

12
- 21544443387
- M. Ishida, I. Katakabe, T. Nakamura, and N. Ohtake: Appl. Phys. Lett. 52 (1988) 1326.
- (1988) Appl. Phys. Lett. , vol.52 , pp. 1326
- Ishida, M.¹ Katakabe, I.² Nakamura, T.³ Ohtake, N.⁴

13
- 0001322763
- H. Iizuka, K. Yokoo, and S. Ono: Appl. Phys. Lett. 61 (1992) 2978.
- (1992) Appl. Phys. Lett. , vol.61 , pp. 2978
- Iizuka, H.¹ Yokoo, K.² Ono, S.³

14
- 0029254630
- S. Zhu, F. Wang, H. Lou, and W. Wu: Surf. Coat. Technol. 71 (1995) 9.
- (1995) Surf. Coat. Technol. , vol.71 , pp. 9
- Zhu, S.¹ Wang, F.² Lou, H.³ Wu, W.⁴

15
- 0344235569
- M. Ritala, K. Kukili, and A. Rahtu: Science 288 (2000) 1.
- (2000) Science , vol.288 , pp. 1
- Ritala, M.¹ Kukili, K.² Rahtu, A.³

16
- 0037391773
- Q. Y. Shao, A. D. Li, H. Q. Ling, D. Wu, Y. Wang, Y. Feng, S. Z. Yang, Z. G. Liu, M. Wang, and N. B. Ming: Microelectron. Eng. 66 (2003) 842.
- (2003) Microelectron. Eng. , vol.66 , pp. 842
- Shao, Q.Y.¹ Li, A.D.² Ling, H.Q.³ Wu, D.⁴ Wang, Y.⁵ Feng, Y.⁶ Yang, S.Z.⁷ Liu, Z.G.⁸ Wang, M.⁹ Ming, N.B.¹⁰

17
- 0031187493
- W. Koh, S.-J. Ku, and Y. Kim: Thin Solid Films 304 (1997) 222.
- (1997) Thin Solid Films , vol.304 , pp. 222
- Koh, W.¹ Ku, S.-J.² Kim, Y.³

18
- 0033741925
- M. Sugiyama, H. Itoh, J. Aoyama, H. Komiyama, and Y. Shimogaki: Jpn. J. Appl. Phys. 39 (2000) 1074.
- (2000) Jpn. J. Appl. Phys. , vol.39 , pp. 1074
- Sugiyama, M.¹ Itoh, H.² Aoyama, J.³ Komiyama, H.⁴ Shimogaki, Y.⁵

19
- 30944448817
- M. Sugiyama, T. Iino, T. Nakajima, T. Tanaka, Y. Egashira, K. Yamashita, H. Komiyama, and Y. Shimogaki: Thin Solid Films 498 (2006) 30.
- (2006) Thin Solid Films , vol.498 , pp. 30
- Sugiyama, M.¹ Iino, T.² Nakajima, T.³ Tanaka, T.⁴ Egashira, Y.⁵ Yamashita, K.⁶ Komiyama, H.⁷ Shimogaki, Y.⁸

20
- 0034470891
- M. Sugiyama, T. Nakajima, T. Tanaka, H. Itoh, J. Aoyama, Y. Egashira, K. Yamashita, H. Komiyama, and Y. Shimogaki: Jpn. J. Appl. Phys. 39 (2000) 6501.
- (2000) Jpn. J. Appl. Phys. , vol.39 , pp. 6501
- Sugiyama, M.¹ Nakajima, T.² Tanaka, T.³ Itoh, H.⁴ Aoyama, J.⁵ Egashira, Y.⁶ Yamashita, K.⁷ Komiyama, H.⁸ Shimogaki, Y.⁹

21
- 0347477361
- T. Cacouris, G. Scelsi, P. Shaw, R. Scarmozzino, and R. M. Osgood: Appl. Phys. Lett. 52 (1988) 1865.
- (1988) Appl. Phys. Lett. , vol.52 , pp. 1865
- Cacouris, T.¹ Scelsi, G.² Shaw, P.³ Scarmozzino, R.⁴ Osgood, R.M.⁵

22
- 0007770791
- R. Bhat, M. A. Koza, C. C. Chang, and S. A. Schwars: J. Cryst. Growth 77 (1986) 7.
- (1986) J. Cryst. Growth , vol.77 , pp. 7
- Bhat, R.¹ Koza, M.A.² Chang, C.C.³ Schwars, S.A.⁴

23
- 27344452567
- H. C. Lin, P. D. Ye, and G. D. Wilk: Appl. Phys. Lett. 87 (2005) 182904.
- (2005) Appl. Phys. Lett. , vol.87 , pp. 182904
- Lin, H.C.¹ Ye, P.D.² Wilk, G.D.³

24
- 68249087898
- G. He, S. Toyoda, Y. Shimogaki, and M. Oshima: Appl. Phys. Express 2 (2009) 075503.
- (2009) Appl. Phys. Express , vol.2 , pp. 075503
- He, G.¹ Toyoda, S.² Shimogaki, Y.³ Oshima, M.⁴

25
- 13444281994
- Y. S. Min, Y. J. Cho, and C. S. Hwang: Chem. Mater. 17 (2005) 626.
- (2005) Chem. Mater. , vol.17 , pp. 626
- Min, Y.S.¹ Cho, Y.J.² Hwang, C.S.³

26
- 0020475746
- J. G. Kim, C. S. Park, and J. S. Chun: Thin Solid Films 97 (1982) 97.
- (1982) Thin Solid Films , vol.97 , pp. 97
- Kim, J.G.¹ Park, C.S.² Chun, J.S.³

27
- 1242320224
- M. D. Groner, F. H. Fabreguette, J. W. Elam, and S. M. George: Chem. Mater. 16 (2004) 639.
- (2004) Chem. Mater. , vol.16 , pp. 639
- Groner, M.D.¹ Fabreguette, F.H.² Elam, J.W.³ George, S.M.⁴

28
- 0000592152
- J. H. Gladstone and T. P. Dale: Philos. Trans. R. Soc. London 153 (1863) 317.
- (1863) Philos. Trans. R. Soc. London , vol.153 , pp. 317
- Gladstone, J.H.¹ Dale, T.P.²

29
- 0003972070
- (Cambridge University Press, Cambridge, U.K.) 7th ed.
- M. Born and E. Wolf: Principles of Optics (Cambridge University Press, Cambridge, U.K., 1999) 7th ed., p. 89.
- (1999) Principles of Optics , pp. 89
- Born, M.¹ Wolf, E.²

30
- 0017534649
- W. A. Pliskin: J. Vac. Sci. Technol. 14 (1977) 1064.
- (1977) J. Vac. Sci. Technol. , vol.14 , pp. 1064
- Pliskin, W.A.¹

31
- 0032334777
- J. C. Alonso, R. Vazquez, A. Ortiz, V. Pankov, and E. Andrade: J. Vac. Sci. Technol. A 16 (1998) 3211.
- (1998) J. Vac. Sci. Technol. A , vol.16 , pp. 3211
- Alonso, J.C.¹ Vazquez, R.² Ortiz, A.³ Pankov, V.⁴ Andrade, E.⁵

32
- 2542461138
- J. C. Lee and S. J. Oh: Appl. Phys. Lett. 84 (2004) 3561.
- (2004) Appl. Phys. Lett. , vol.84 , pp. 3561
- Lee, J.C.¹ Oh, S.J.²

33
- 0037103573
- M. Kundu, N. Miyata, and M. Ichikawa: J. Appl. Phys. 92 (2002) 1914.
- (2002) J. Appl. Phys. , vol.92 , pp. 1914
- Kundu, M.¹ Miyata, N.² Ichikawa, M.³

34
- 33646594144
- E. Martinez, A. Abbadie, O. Renault, I. Cayrefourcq, and S. Quiais- Marthon: Surf. Interface Anal. 38 (2006) 437.
- (2006) Surf. Interface Anal. , vol.38 , pp. 437
- Martinez, E.¹ Abbadie, A.² Renault, O.³ Cayrefourcq, I.⁴ Quiais-Marthon, S.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.