Reaction analysis of aluminum chemical vapor deposition from dimethyl-aluminum-hydride using tubular reactor and fourier-transform infrared spectroscopy: Theoretical process optimization procedure (1)

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 3 A, 2000, Pages 1074-1079

  Sugiyama, Masakazu ^a   Itoh, Hitoshi ^b   Aoyama, Jyun Ichi ^b   Komiyama, Hiroshi ^a   Shimogaki, Yukihiro ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b Semiconductor Academic Research Center (STARC)   (Japan)

Author keywords

Aluminum; Chemical vapor deposition (CVD); Dimethylaluminumhydride (DMAH); Fourier transform infrared spectroscopy (FT IR); Reaction analysis

Indexed keywords

ACTIVATION ENERGY; ALUMINUM COMPOUNDS; CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MATHEMATICAL MODELS; QUANTUM THEORY; REACTION KINETICS;

BUBBLING METHOD; DIMETHYL ALUMINUM HYDRIDE; TUBULAR REACTOR;

ALUMINUM;

EID: 0033741925     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.1074     Document Type: Article

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